Verschueren Daniel V, Yang Wayne, Dekker Cees
Nanotechnology. 2018 Apr 6;29(14):145302. doi: 10.1088/1361-6528/aaabce.
We report a simple and scalable technique for the fabrication of nanopore arrays on freestanding SiN and graphene membranes based on electron-beam lithography and reactive ion etching. By controlling the dose of the single-shot electron-beam exposure, circular nanopores of any size down to 16 nm in diameter can be fabricated in both materials at high accuracy and precision. We demonstrate the sensing capabilities of these nanopores by translocating dsDNA through pores fabricated using this method, and find signal-to-noise characteristics on par with transmission-electron-microscope-drilled nanopores. This versatile lithography-based approach allows for the high-throughput manufacturing of nanopores and can in principle be used on any substrate, in particular membranes made out of transferable two-dimensional materials.
我们报道了一种基于电子束光刻和反应离子蚀刻在独立的氮化硅和石墨烯膜上制造纳米孔阵列的简单且可扩展的技术。通过控制单次电子束曝光的剂量，可以在这两种材料中高精度地制造出直径小至16纳米的任何尺寸的圆形纳米孔。我们通过使双链DNA穿过用这种方法制造的孔来展示这些纳米孔的传感能力，并发现其信噪比特性与透射电子显微镜钻出的纳米孔相当。这种基于光刻的通用方法允许高通量制造纳米孔，并且原则上可以用于任何基板，特别是由可转移二维材料制成的膜。
