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铈掺杂β-GaO外延薄膜及深紫外光电探测器的制备

Fabrication of cerium-doped β-GaO epitaxial thin films and deep ultraviolet photodetectors.

作者信息

Li Wenhao, Zhao Xiaolong, Zhi Yusong, Zhang Xuhui, Chen Zhengwei, Chu Xulong, Yang Hujiang, Wu Zhenping, Tang Weihua

出版信息

Appl Opt. 2018 Jan 20;57(3):538-543. doi: 10.1364/AO.57.000538.

DOI:10.1364/AO.57.000538
PMID:29400778
Abstract

High-quality cerium-doped β-GaO (GaO:Ce) thin films could be achieved on (0001)α-AlO substrates using a pulsed-laser deposition method. The impact of dopant contents concentration on crystal structure, optical absorption, photoluminescence, and photoelectric properties has been intensively studied. X-ray diffraction analysis results have shown that GaO:Ce films are highly (2¯01) oriented, and the lattice spacing of the (4¯02) planes is sensitive to the Ce doping level. The prepared GaO:Ce films show a sharp absorption edge at about 250 nm, meaning a high transparency to deep ultraviolet (DUV) light. The photoluminescence results revealed that the emissions were in the violet-blue-green region, which are associated with the donor-acceptor transitions with the Ce and oxygen vacancies related defects. A simple DUV photodetector device with a metal-semiconductor-metal structure has also been fabricated based on GaO:Ce thin film. A distinct DUV photoresponse was obtained, suggesting a potential application in DUV photodetector devices.

摘要

采用脉冲激光沉积法,可在(0001)α -Al₂O₃衬底上制备出高质量的铈掺杂β -Ga₂O₃(Ga₂O₃:Ce)薄膜。深入研究了掺杂剂含量浓度对晶体结构、光吸收、光致发光和光电性能的影响。X射线衍射分析结果表明,Ga₂O₃:Ce薄膜具有高度的(2¯01)取向,(4¯02)平面的晶格间距对Ce掺杂水平敏感。制备的Ga₂O₃:Ce薄膜在约250 nm处呈现出尖锐的吸收边,这意味着对深紫外(DUV)光具有高透明度。光致发光结果表明,发射光位于紫 - 蓝 - 绿区域,这与与Ce和氧空位相关缺陷的施主 - 受主跃迁有关。基于Ga₂O₃:Ce薄膜还制备了一种具有金属 - 半导体 - 金属结构的简单深紫外光电探测器器件。获得了明显的深紫外光响应,表明其在深紫外光电探测器器件中具有潜在应用。

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