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硅芯片上的宽带2微米发射:单片集成钬激光器。

Broadband 2-µm emission on silicon chips: monolithically integrated Holmium lasers.

作者信息

Li Nanxi, Magden Emir Salih, Su Zhan, Singh Neetesh, Ruocco Alfonso, Xin Ming, Byrd Matthew, Callahan Patrick T, Bradley Jonathan D B, Baiocco Christopher, Vermeulen Diedrik, Watts Michael R

出版信息

Opt Express. 2018 Feb 5;26(3):2220-2230. doi: 10.1364/OE.26.002220.

DOI:10.1364/OE.26.002220
PMID:29401762
Abstract

Laser sources in the mid-infrared are of great interest due to their wide applications in detection, sensing, communication and medicine. Silicon photonics is a promising technology which enables these laser devices to be fabricated in a standard CMOS foundry, with the advantages of reliability, compactness, low cost and large-scale production. In this paper, we demonstrate a holmium-doped distributed feedback laser monolithically integrated on a silicon photonics platform. The AlO:Ho glass is used as gain medium, which provides broadband emission around 2 µm. By varying the distributed feedback grating period and AlO:Ho gain layer thickness, we show single mode laser emission at wavelengths ranging from 2.02 to 2.10 µm. Using a 1950 nm pump, we measure a maximum output power of 15 mW, a slope efficiency of 2.3% and a side-mode suppression ratio in excess of 50 dB. The introduction of a scalable monolithic light source emitting at > 2 µm is a significant step for silicon photonic microsystems operating in this highly promising wavelength region.

摘要

由于在检测、传感、通信和医学等方面的广泛应用,中红外激光源备受关注。硅光子学是一项很有前景的技术,它能使这些激光器件在标准CMOS代工厂中制造,具有可靠性高、紧凑、低成本和大规模生产的优点。在本文中,我们展示了一种单片集成在硅光子学平台上的掺钬分布反馈激光器。AlO:Ho玻璃用作增益介质,它在2 µm左右提供宽带发射。通过改变分布反馈光栅周期和AlO:Ho增益层厚度,我们展示了在2.02至2.10 µm波长范围内的单模激光发射。使用1950 nm泵浦,我们测得最大输出功率为15 mW,斜率效率为2.3%,边模抑制比超过50 dB。引入一种在大于2 µm波长处发射的可扩展单片光源,对于在这个极具前景的波长区域工作的硅光子微系统来说是重要的一步。

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