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含分散氧化锌量子点的聚甲基丙烯酸甲酯/二氧化硅杂化薄膜的制备

Preparation of Poly(Methyl Methacrylate)/Silica Hybrid Film with Dispersed ZnO Quantum Dots.

作者信息

Kim Kwonbeen, Kim Jongsung

机构信息

Department of Chemical and Biological Engineering, Gachon University, Seongnam-si, Gyeonggi-do, 13120, Korea.

出版信息

J Nanosci Nanotechnol. 2018 Feb 1;18(2):1074-1077. doi: 10.1166/jnn.2018.14900.

DOI:10.1166/jnn.2018.14900
PMID:29448535
Abstract

Quantum dots have recently been adopted in display devices for color compensation with light emitting diodes (LEDs). One of the major limitations in using QDs is the thermal instability of photoluminescence (PL) owing to the heat dissipation of LEDs. In this study, transparent hybrid films of ZnO quantum dots (QDs) dispersed in poly(methyl methacrylate) (PMMA) with silica were prepared, and the thermal stability of the fluorescence of the films was investigated. ZnO QDs were synthesized by a thermal decomposition process and exhibited a PL emission peak at 475 nm with excitation at 320 nm. The ZnO QDs were spherical in shape with an average diameter of 3 nm. The PL intensity of the ZnO QD-PMMA films decreased with an increase in temperature. With increased silica content in the ZnO QD-PMMA/silica films, the PL quenching was reduced.

摘要

量子点最近已被应用于显示设备中,用于与发光二极管(LED)进行颜色补偿。使用量子点的主要限制之一是由于LED的散热导致光致发光(PL)的热稳定性较差。在本研究中,制备了分散在聚甲基丙烯酸甲酯(PMMA)与二氧化硅中的ZnO量子点(QDs)透明混合薄膜,并研究了薄膜荧光的热稳定性。ZnO量子点通过热分解过程合成,在320nm激发下在475nm处呈现PL发射峰。ZnO量子点呈球形,平均直径为3nm。ZnO量子点-PMMA薄膜的PL强度随温度升高而降低。随着ZnO量子点-PMMA/二氧化硅薄膜中二氧化硅含量的增加,PL猝灭减少。

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