Kim Uk Su, Park Jeong Woo
Department of Mechanical System Engineering, Chosun University, Gwangju, 61452, Republic of Korea.
School of Mechanical System and Automotive Engineering, Chosun University, Gwangju, 61452, Republic of Korea.
J Nanosci Nanotechnol. 2018 Mar 1;18(3):1926-1930. doi: 10.1166/jnn.2018.14987.
A direct mechanical nanomachining, tribo-nanolithography (TNL), has been developed to fabricate micro mold on Si substrate in mechanical milling mode. An atomic force microscope (AFM) tip is replaced by a lab-made Si cantilever with a polycrystalline diamond (PCD) tool. Mechanical cutting by PCD tool enables simple fabrication of micro molds with several tens of nanometers depth. Machined cavities of the Si substrate are prepared as a master mold for additional micro molding using polydimethylsiloxane (PDMS). Micro cavities are successfully duplicated in positive patterns similar to soft lithography. Normal loads of cantilever and AFM topographical images are used to discuss micro mold and micro molding characteristics.
一种直接机械纳米加工技术，即摩擦纳米光刻（TNL），已被开发用于在机械铣削模式下在硅衬底上制造微模具。用实验室制作的带有多晶金刚石（PCD）工具的硅悬臂替换原子力显微镜（AFM）探针。PCD工具进行的机械切割能够简单地制造出深度为几十纳米的微模具。将硅衬底上加工出的型腔制备成母模，用于使用聚二甲基硅氧烷（PDMS）进行额外的微成型。微型腔成功地复制成了类似于软光刻的正图案。利用悬臂的法向载荷和AFM形貌图像来讨论微模具和微成型的特性。
