Rice Quinton, Tabibi Bagher, Seo Felix Jaetae
Advanced Center for Laser Science and Spectroscopy, Department of Physics, Hampton University, Hampton, Virginia, 23668, USA.
J Nanosci Nanotechnol. 2018 Mar 1;18(3):2018-2020. doi: 10.1166/jnn.2018.14955.
The atomic layers of transition metal dichalcogenides (TMDCs, MX2; M = Mo or W; X = S, Se, or Te) are of great interest in the areas of photonics and optoelectronics due to the correlation between valley orbital, spin, and optical helicity; the compositional tuning of exciton bandgaps in visible and near-infrared spectra; and the bandgap modification from indirect for bilayer or multilayer to direct for monolayer. The derivative of the O'Donnell and Chen relation is analyzed as a function of temperature and gives the relationship between the change in entropy of exciton formation and the bandgap energy. The analysis suggests the change in entropy of exciton formation with higher energy phonons (100 meV) is constant until ~90 K while lower energy phonons (10 meV) approaches a constant value of -2skB between ~250 K and ~300 K where s is the strength of electron-phonon interaction and kB is the Boltzmann constant. Increased scattering and spontaneous decay probabilities explains the amplified electron-phonon interaction when the phonon energy is large. The change in exciton formation entropy can be increased ~3-fold while the bandgap is managed through the electron-phonon coupling strength.
过渡金属二硫属化物(TMDCs,MX₂;M = 钼或钨;X = 硫、硒或碲)的原子层在光子学和光电子学领域备受关注,这是由于谷轨道、自旋和光学螺旋度之间的相关性;可见光和近红外光谱中激子带隙的成分调谐;以及从双层或多层的间接带隙到单层的直接带隙的带隙修饰。对奥多内尔和陈关系式的导数作为温度的函数进行了分析,并给出了激子形成熵的变化与带隙能量之间的关系。分析表明,激子形成熵随能量较高的声子(100毫电子伏)的变化在90K之前是恒定的,而能量较低的声子(10毫电子伏)在250K至~300K之间接近-2skB的恒定值,其中s是电子-声子相互作用强度,kB是玻尔兹曼常数。当声子能量较大时,散射和自发衰变概率的增加解释了放大的电子-声子相互作用。当通过电子-声子耦合强度控制带隙时,激子形成熵的变化可以增加约3倍。