Kang Boseok, Kim Haena, Han Joong Tark, Kim Dae Gun, Cho Kilwon
Department of Chemical Engineering and Center for Advanced Soft Electronics, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang, 37673, South Korea.
Nano Hybrid Technology Research Center, Korea Electrotechnology Research Institute, 12, Bulmosan-ro 10 beon-gil, Seongsan-gu, Changwon, 51543, South Korea.
Small. 2018 Mar;14(13):e1703697. doi: 10.1002/smll.201703697. Epub 2018 Feb 19.
The fine control of graphene doping levels over a wide energy range remains a challenging issue for the electronic applications of graphene. Here, the controllable doping of chemical vapor deposited graphene, which provides a wide range of energy levels (shifts up to ± 0.5 eV), is demonstrated through physical contact with chemically versatile graphene oxide (GO) sheets, a 2D dopant that can be solution-processed. GO sheets are a p-type dopant due to their abundance of electron-withdrawing functional groups. To expand the energy window of GO-doped graphene, the GO surface is chemically modified with electron-donating ethylene diamine molecules. The amine-functionalized GO sheets exhibit strong n-type doping behaviors. In addition, the particular physicochemical characteristics of the GO sheets, namely their sheet sizes, number of layers, and degree of oxidation and amine functionality, are systematically varied to finely tune their energy levels. Finally, the tailor-made GO sheet dopants are applied into graphene-based electronic devices, which are found to exhibit improved device performances. These results demonstrate the potential of GO sheet dopants in many graphene-based electronics applications.
对于石墨烯的电子应用而言,在宽能量范围内精细控制石墨烯的掺杂水平仍然是一个具有挑战性的问题。在此,通过与化学性质多样的二维掺杂剂氧化石墨烯(GO)片材进行物理接触,证明了化学气相沉积石墨烯的可控掺杂,这种氧化石墨烯片材可通过溶液处理,能提供宽范围的能级(高达±0.5 eV的能级移动)。由于GO片材含有大量吸电子官能团,所以它是一种p型掺杂剂。为了扩大GO掺杂石墨烯的能量窗口,用供电子的乙二胺分子对GO表面进行化学修饰。胺官能化的GO片材表现出强烈的n型掺杂行为。此外,系统地改变GO片材的特定物理化学特性,即其片材尺寸、层数、氧化程度和胺官能度,以精细调节其能级。最后,将定制的GO片材掺杂剂应用于基于石墨烯的电子器件中,发现这些器件的性能得到了改善。这些结果证明了GO片材掺杂剂在许多基于石墨烯的电子应用中的潜力。