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气相分子掺杂石墨烯用于高性能透明电极。

Vapor-phase molecular doping of graphene for high-performance transparent electrodes.

机构信息

Department of Chemistry and ‡Department of Physics & Astronomy, Seoul National University , 1 Gwanak-ro, Seoul 151-742, Korea.

出版信息

ACS Nano. 2014 Jan 28;8(1):868-74. doi: 10.1021/nn405596j. Epub 2013 Dec 10.

DOI:10.1021/nn405596j
PMID:24313602
Abstract

Doping is an essential process to engineer the conductivity and work-function of graphene for higher performance optoelectronic devices, which includes substitutional atomic doping by reactive gases, electrical/electrochemical doping by gate bias, and chemical doping by acids or reducing/oxidizing agents. Among these, the chemical doping has been widely used due to its simple process and high doping strength. However, it also has an instability problem in that the molecular dopants tend to gradually evaporate from the surface of graphene, leading to substantial decrease in doping effect with time. In particular, the instability problem is more serious for n-doped graphene because of undesirable reaction between dopants and oxygen or water in air. Here we report a simple method to tune the electrical properties of CVD graphene through n-doping by vaporized molecules at 70 °C, where the dopants in vapor phase are mildly adsorbed on graphene surface without direct contact with solution. To investigate the dependence on functional groups and molecular weights, we selected a series of ethylene amines as a model system, including ethylene diamine (EDA), diethylene triamine (DETA), and triethylene tetramine (TETA) with increasing number of amine groups showing different vapor pressures. We confirmed that the vapor-phase doping provides not only very high carrier concentration but also good long-term stability in air, which is particularly important for practical applications.

摘要

掺杂是工程化石墨烯电导率和功函数以实现更高性能光电器件的必要过程,包括通过反应气体进行的取代原子掺杂、通过栅极偏压进行的电/电化学掺杂以及通过酸或还原/氧化剂进行的化学掺杂。在这些掺杂方法中,化学掺杂由于其简单的工艺和高掺杂强度而被广泛应用。然而,它也存在不稳定性问题,即分子掺杂剂往往会从石墨烯表面逐渐蒸发,导致掺杂效果随时间显著下降。特别是对于 n 型掺杂石墨烯,由于掺杂剂与空气中的氧或水之间的不良反应,不稳定性问题更为严重。在这里,我们报告了一种通过在 70°C 下蒸发分子对 CVD 石墨烯进行 n 掺杂来调节其电性能的简单方法,其中气相中的掺杂剂在没有与溶液直接接触的情况下被轻度吸附在石墨烯表面上。为了研究功能基团和分子量的依赖性,我们选择了一系列乙二胺作为模型体系,包括乙二胺(EDA)、二乙烯三胺(DETA)和三乙烯四胺(TETA),随着胺基团数量的增加,它们的蒸气压也不同。我们证实,气相掺杂不仅提供了非常高的载流子浓度,而且在空气中也具有良好的长期稳定性,这对于实际应用尤为重要。

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