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优化 InO(ZnO) 自然超晶格中 InO 单原子层的界面输运性能,以提高高温热电性能。

Optimizing interfacial transport properties of InO single atomic layers in InO(ZnO) natural superlattices for enhanced high temperature thermoelectrics.

机构信息

School of Materials Science and Engineering, Changzhou University, Changzhou, Jiangsu 213164, China.

出版信息

Nanoscale. 2018 Mar 1;10(9):4500-4514. doi: 10.1039/c7nr09585f.

DOI:10.1039/c7nr09585f
PMID:29459930
Abstract

InO(ZnO) natural superlattices (where k is an integer), consisting of relatively earth abundant and non-toxic elements with coarsening-resistant nanostructures, are environmentally friendly materials with the potential for high temperature thermoelectric applications. Herein, we report our investigation of the high temperature thermoelectric properties of the InO(ZnO) superlattice bulk polycrystals that were singly and dually doped with Al and Ce. Transport property measurements revealed that Al and Ce did not only enter the ZnO blocks but also modified the InO single atomic layers. The effective electron potential barrier height of the superlattice interfaces can be adjusted by doping, and the optimal value that maximizes the power factor is of the order of kT above the Fermi level. The interfacial thermal (Kapitza) resistance of the InO atomic sheets dramatically increased with doping, primarily accounting for the bulk thermal conductivity reduction. At the optimal crossing of the interfacial thermal resistance and the effective potential barrier height, a maximum ZT of ≈0.22 was achieved at 800 °C in the 1.6 mol% Al-doped superlattice, which was an enhancement of ∼200% over the pristine InO(ZnO). This work provides a new perspective on enhancing the high temperature thermoelectric performance of nanostructured oxides by synergistically optimizing the interfacial phonon and electron transport properties.

摘要

InO(ZnO) 天然超晶格(其中 k 为整数)由相对丰富和无毒的元素组成,具有抗粗化的纳米结构,是环境友好型材料,具有在高温下应用的潜力。在此,我们报告了对 Al 和 Ce 单掺杂和双掺杂的 InO(ZnO) 超晶格多晶块体的高温热电性能的研究。输运性质测量表明,Al 和 Ce 不仅进入了 ZnO 块体,而且还修饰了 InO 单层原子。超晶格界面的有效电子势垒高度可以通过掺杂进行调节,使功率因子最大化的最佳值约为费米能级以上 kT。掺杂后,InO 原子片的界面热(卡皮查)电阻显著增加,主要导致体热导率降低。在界面热阻和有效势垒高度的最佳交叉处,在 1.6 mol% Al 掺杂的超晶格中,在 800°C 时达到了约 0.22 的最大 ZT,比原始的 InO(ZnO) 提高了约 200%。这项工作为通过协同优化界面声子和电子输运性质来提高纳米结构氧化物的高温热电性能提供了新的视角。

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