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近乎单位效率的完美垂直光栅耦合器的逆向设计。

Inverse design of near unity efficiency perfectly vertical grating couplers.

作者信息

Michaels Andrew, Yablonovitch Eli

出版信息

Opt Express. 2018 Feb 19;26(4):4766-4779. doi: 10.1364/OE.26.004766.

Abstract

Efficient coupling between integrated optical waveguides and optical fibers is essential to the success of silicon photonics. While many solutions exist, perfectly vertical grating couplers that scatter light out of a waveguide in the direction normal to the waveguide's top surface are an ideal candidate due to their potential to reduce packaging complexity. Designing such couplers with high efficiencies, however, has proven difficult. In this paper, we use inverse electromagnetic design techniques to optimize a high efficiency two-layer perfectly vertical silicon grating coupler. Our base design achieves a chip-to-fiber coupling efficiency of 99.2% (-0.035 dB) at 1550 nm. Using this base design as a starting point, we run subsequent constrained optimizations to realize vertical couplers with coupling efficiencies over 96% and back reflections of less than -40 dB which can be fabricated using 65 nm-resolution lithography. These results demonstrate a new path forward for designing fabrication-tolerant ultra high efficiency grating couplers.

摘要

集成光波导与光纤之间的高效耦合对于硅光子学的成功至关重要。虽然存在许多解决方案,但能够将光从波导中沿垂直于波导顶面的方向散射出去的完美垂直光栅耦合器,因其具有降低封装复杂性的潜力,是理想的选择。然而,事实证明,设计出具有高效率的此类耦合器颇具难度。在本文中,我们采用逆电磁设计技术来优化一种高效双层完美垂直硅光栅耦合器。我们的基础设计在1550纳米波长处实现了99.2%(-0.035分贝)的芯片到光纤耦合效率。以该基础设计为起点,我们进行后续的约束优化,以实现耦合效率超过96%且背向反射小于-40分贝的垂直耦合器,这些耦合器可采用65纳米分辨率光刻技术制造。这些结果为设计耐制造的超高效率光栅耦合器指明了一条新途径。

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