Trinh Quang Hung, Hossain Md Mokter, Kim Seong H, Mok Young Sun
Department of Chemical and Biological Engineering, Jeju National University, Jeju 690-756, Republic of Korea.
Department of Chemical Engineering, Pennsylvania State University, University Park, PA 16802, USA.
Heliyon. 2018 Feb 1;4(1):e00522. doi: 10.1016/j.heliyon.2018.e00522. eCollection 2018 Jan.
A double dielectric barrier discharge reactor operated at a low power frequency of 400 Hz and atmospheric pressure was utilized for regulating the wettability of glass surface. The hydrophobic treatment was performed by plasma polymerization of tetramethylsilane (TMS, in argon gas). The obtained results showed that the TMS coatings formed on the glass substrates without oxygen addition were smooth, uniform films with the maximum water contact angle (WCA) of about 106°, which were similar to those obtained by low pressure, high power frequency plasmas reported in the literature. The addition of oxygen into TMS/Ar plasma gas decreased the WCA and induced the formation of SiOSi and/or SiOC linkages, which dominated the existence of Si(CH)Si network formed in TMS/Ar (without oxygen) plasma.
一个在400Hz低功率频率和大气压下运行的双介质阻挡放电反应器被用于调节玻璃表面的润湿性。疏水处理通过四甲基硅烷（TMS，在氩气中）的等离子体聚合来进行。所得结果表明，在不添加氧气的情况下在玻璃基板上形成的TMS涂层是光滑、均匀的薄膜，最大水接触角（WCA）约为106°，这与文献中报道的通过低压、高功率频率等离子体获得的结果相似。向TMS/Ar等离子体气体中添加氧气降低了WCA，并诱导形成了SiOSi和/或SiOC键，这些键主导了在TMS/Ar（无氧）等离子体中形成的Si(CH)Si网络的存在。
