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低温低压 O 等离子体处理藏红花:一种有效去除有毒真菌而对藏红花分子和细胞特性影响较小的方法。

Cold low pressure O plasma treatment of Crocus sativus: An efficient way to eliminate toxicogenic fungi with minor effect on molecular and cellular properties of saffron.

机构信息

Faculty of Physics, Shahrood University of Technology, Shahrood 3619995161, Iran.

Department of Cell & Molecular Biology, Faculty of Life Sciences & Biotechnology, Shahid Beheshti University, G.C., Evin, Tehran 1983963113, Iran.

出版信息

Food Chem. 2018 Aug 15;257:310-315. doi: 10.1016/j.foodchem.2018.03.031. Epub 2018 Mar 9.

DOI:10.1016/j.foodchem.2018.03.031
PMID:29622216
Abstract

In this study cold low pressure radiofrequency oxygen plasma was used for the first time to inactivate toxicogenic fungi proliferation on saffron. Varieties of plasma produced reactive oxygen species which were investigated by optical emission spectroscopy. The data were indicative of the absence of UV radiation. Effects of plasma treatment on antioxidant activity, metabolic content, colour, odour and flavour parameters and physical impact on saffron were investigated. A range of plasma powers and exposure times were assayed in suppression of fungal growth. Amongst which power of 60 W for 15 min was used to eradicate Aspergillus and other microorganisms. The ferric reducing antioxidant power was changed from 1778.21 to 1674.25 mM/g dry weight following plasma treatment. Moreover, crocin ester, picrocrocin and safranal metabolites reduced insignificantly. Additionally, plasma had no significant impact on colour, odour and flavour of saffron.

摘要

在这项研究中,冷低压射频氧等离子体首次被用于抑制藏红花上产毒真菌的生长。通过发射光谱法研究了等离子体产生的活性氧物质。数据表明不存在紫外线辐射。研究了等离子体处理对藏红花抗氧化活性、代谢成分、颜色、气味和味道参数以及物理影响。在抑制真菌生长方面,对不同的等离子体功率和暴露时间进行了测试。其中,功率为 60W、时间为 15 分钟的处理可以消灭曲霉菌和其他微生物。铁还原抗氧化能力从等离子体处理前的 1778.21 到 1674.25mM/g 干重发生了变化。此外,藏红花酸酯、苦藏花素和西红花醛的代谢物含量也有显著下降。此外,等离子体对藏红花的颜色、气味和味道没有显著影响。

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