Amirsadeghi Alborz, Brumfield Lance, Choi Junseo, Brown Emily, Lee Jae Jong, Park Sunggook
Mechanical Engineering Department and Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, USA.
Nano-Mechanical Systems Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-Gu, Daejeon 305-343, South Korea.
J Appl Phys. 2017 Jan 28;121(4):044909. doi: 10.1063/1.4974533. Epub 2017 Jan 31.
Hydrophobic silane coatings have been successfully applied to the surface of Si stamps to improve demolding in nanoimprint lithography (NIL). However, the role of the silane coating has only been studied either indirectly, by measuring adhesion or friction coefficients for Si and substrate surfaces without patterns, or collectively, by measuring the overall demolding force that does not differentiate contributions of friction dissipation, stored elastic energy, and adhesion. Here, for the first time, we present experimental evidence on the role of the silane coating in improving demolding in UV-NIL by using different silane coatings. The silane coatings were characterized by x-ray photoelectron spectroscopy, water contact angle, and friction force measurements. Then, the work of demolding was systematically measured for different silane coatings using stamps with the same micropattern but different pattern depths. Comparison of the results to the theoretical model developed for fiber-matrix debonding energy by Sutcu and Hillig [Acta Metall. Mater. 12), 2653-2662] indicated that with a hydrophobic silane coating, the main parameter contributing to overall demolding work shifts from adhesion to stored elastic energy and frictional dissipation as surface adhesion keeps decreasing. The results confirm that the main role of the silane coating in reducing the demolding is to reduce surface adhesion rather than friction at the stamp/substrate interface.
疏水性硅烷涂层已成功应用于硅压模表面,以改善纳米压印光刻(NIL)中的脱模过程。然而,硅烷涂层的作用仅通过间接方式进行了研究,即测量无图案的硅和基底表面的粘附力或摩擦系数,或者通过测量未区分摩擦耗散、储存的弹性能和粘附力贡献的总脱模力进行整体研究。在此,我们首次通过使用不同的硅烷涂层,给出了关于硅烷涂层在紫外纳米压印光刻中改善脱模作用的实验证据。通过X射线光电子能谱、水接触角和摩擦力测量对硅烷涂层进行了表征。然后,使用具有相同微图案但不同图案深度的压模,系统地测量了不同硅烷涂层的脱模功。将结果与Sutcu和Hillig [《金属学报》12卷,2653 - 2662页] 为纤维 - 基体脱粘能建立的理论模型进行比较表明,随着表面粘附力不断降低,使用疏水性硅烷涂层时,对总脱模功起主要作用的参数从粘附力转变为储存的弹性能和摩擦耗散。结果证实,硅烷涂层在降低脱模力方面的主要作用是降低表面粘附力,而非压模/基底界面处的摩擦力。