Department of Materials Science and Engineering , Iowa State University of Science and Technology , 2220 Hoover Hall , Ames , Iowa 50011 , United States.
Department of Chemistry , Iowa State University of Science and Technology , Gilman Hall , Ames , Iowa 50011 , United States.
ACS Appl Mater Interfaces. 2018 Jun 20;10(24):20740-20747. doi: 10.1021/acsami.8b03771. Epub 2018 Jun 6.
This paper describes a simple approach to the large-scale synthesis of colloidal Si nanocrystals and their processing into spin-on carbon-free nanocrystalline Si films. The synthesized silicon nanoparticles are capped with decene, dispersed in hexane, and deposited on silicon substrates. The deposited films are exposed to nonoxidizing room-temperature He plasma to remove the organic ligands without adversely affecting the silicon nanoparticles to form crack-free thin films. We further show that the reactive ion etching rate in these films is 1.87 times faster than that for single-crystalline Si, consistent with a simple geometric argument that accounts for the nanoscale roughness caused by the nanoparticle shape.
本文介绍了一种简单的方法，用于大规模合成胶体硅纳米晶，并将其加工成旋涂无碳纳米晶硅薄膜。合成的硅纳米颗粒用癸烯封端，分散在正己烷中，并沉积在硅衬底上。沉积的薄膜暴露在非氧化的室温氦等离子体中，以去除有机配体，而不会对硅纳米颗粒造成不利影响，从而形成无裂纹的薄膜。我们进一步表明，这些薄膜的反应离子刻蚀速率比单晶硅快 1.87 倍，这与一个简单的几何论点一致，该论点解释了由纳米颗粒形状引起的纳米级粗糙度。
