Kwon Da-Sol, Nam Hui-Gyun, Jung Chan-Hee, Yang Donsik, Kim Sang-Tae, Shin Kwanwoo, Choi Jae-Hak
J Nanosci Nanotechnol. 2018 Oct 1;18(10):7018-7022. doi: 10.1166/jnn.2018.15474.
In this study, thin carbon films with good electrical properties were prepared using commercial novolac resins by ion beam irradiation and carbonization. Novolac films were irradiated with ion beams and then carbonized under inert atmosphere. Based on the FTIR and UV results, the novolac resins were found to be crosslinked by ion beam irradiation without any additives. The Raman and XRD results indicate that carbon films with pseudo-graphitic structures were formed by carbonization of the ion beam irradiated novolac films. The sheet resistance of the prepared carbon films decreased to 1.35 × 102 Ω/ with an increasing fluence. The prepared carbon films showed a good electrical conductivity of ∼2.34 × 102 S/cm.