Rizzato Silvia, Primiceri Elisabetta, Monteduro Anna Grazia, Colombelli Adriano, Leo Angelo, Manera Maria Grazia, Rella Roberto, Maruccio Giuseppe
Department of Mathematics and Physics "Ennio De Giorgi", Università del Salento, Via per Arnesano, Lecce, Italy.
CNR NANOTEC - Institute of Nanotechnology, Campus Ecotekne, Via Monteroni, Lecce, Italy.
Beilstein J Nanotechnol. 2018 May 29;9:1582-1593. doi: 10.3762/bjnano.9.150. eCollection 2018.
Colloidal lithography is an innovative fabrication technique employing spherical, nanoscale crystals as a lithographic mask for the low cost realization of nanoscale patterning. The features of the resulting nanostructures are related to the particle size, deposition conditions and interactions involved. In this work, we studied the absorption of polystyrene spheres onto a substrate and discuss the effect of particle-substrate and particle-particle interactions on their organization. Depending on the nature and the strength of the interactions acting in the colloidal film formation, two different strategies were developed in order to control the number of particles on the surface and the interparticle distance, namely changing the salt concentration and absorption time in the particle solution. These approaches enabled the realization of large area (≈cm) patterning of nanoscale holes (nanoholes) and nanoscale disks (nanodisks) of different sizes and materials.
胶体光刻是一种创新的制造技术，它使用球形纳米晶体作为光刻掩膜，以低成本实现纳米级图案化。所得纳米结构的特征与颗粒尺寸、沉积条件以及所涉及的相互作用有关。在这项工作中，我们研究了聚苯乙烯球体在基底上的吸附，并讨论了颗粒与基底以及颗粒与颗粒之间的相互作用对其排列的影响。根据在胶体膜形成过程中起作用的相互作用的性质和强度，开发了两种不同的策略来控制表面上的颗粒数量和颗粒间距离，即改变颗粒溶液中的盐浓度和吸附时间。这些方法能够实现不同尺寸和材料的大面积（≈厘米）纳米级孔洞（纳米孔）和纳米级圆盘（纳米盘）图案化。
