Tan Yinyin, Chen Chao, Chen Xiuguo, Du Weichao, Gu Honggang, Liu Shiyuan
State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China.
Rev Sci Instrum. 2018 Jul;89(7):073702. doi: 10.1063/1.5034440.
In this paper, we describe the development of a novel instrument, tentatively called tomographic Mueller-matrix scatterometer (TMS), which enables illuminating sequentially a sample by a plane wave with varying illumination directions and recording, for each illumination, the polarized scattered field along various directions of observation in the form of scattering Mueller matrices. The incidence angle is varied from 0° to 65.6° with the rotation of a flat mirror that changes the position of the focal point of a light beam on the back focal plane of a high numerical aperture objective lens. The scattering Mueller matrices are collected over a wide range of scattering angles (0°-67°) and azimuthal angles (0°-360°). The developed instrument was then applied for the measurement of nanostructures in combination with an inverse scattering problem solving technique. The experiment performed on a periodic nanostructure preliminarily demonstrates the performance of TMS as well as its potential in nanostructure metrology. It is expected that the TMS would be a powerful tool for characterizing the polarized scattered-field distributions and measuring nanostructures in nanomanufacturing.
在本文中，我们描述了一种新型仪器的开发，该仪器暂称为层析穆勒矩阵散射仪（TMS），它能够用具有不同照明方向的平面波依次照射样品，并针对每次照明，以散射穆勒矩阵的形式记录沿各个观测方向的偏振散射场。通过旋转平面镜来改变光束在高数值孔径物镜后焦平面上焦点的位置，从而使入射角在0°至65.6°之间变化。在很宽的散射角范围（0° - 67°）和方位角范围（0° - 360°）内收集散射穆勒矩阵。然后，将所开发的仪器与反散射问题求解技术相结合，用于纳米结构的测量。对周期性纳米结构进行的实验初步证明了TMS的性能及其在纳米结构计量学中的潜力。预计TMS将成为表征偏振散射场分布和测量纳米制造中的纳米结构的有力工具。
