Ai Jun, Du Qifeng, Qin Zhongli, Liu Jianguo, Zeng Xiaoyan
Opt Express. 2018 Aug 6;26(16):20965-20974. doi: 10.1364/OE.26.020965.
A novel laser direct writing lithography equipment system was proposed to realize rapid and μm-precision fabrication on curved surfaces with large curvatures and large sag heights. Through detailed design, analysis, simulation, and measurement, it showed that the system was able to continuously, linearly and rapidly change the focus position in z coordinate. For demonstration, a concentric-circular photoresist grating with a sag height of 5.2 mm and a designed line width/space of 12.5 μm/25 μm was fabricated within 40 s on a convex K9 glass substrate surface with a curvature radius of 32.77 mm. When combining with the movement of the x-y-z stage, the system could fabricate the micropatterns on curved surfaces with larger dimensions. Further, the system possessed the general principles of optics, mechanics, and automation for μm-precision 3D microfabrication.
提出了一种新型激光直写光刻设备系统，以实现对具有大曲率和大矢高的曲面进行快速且微米级精度的制造。通过详细的设计、分析、模拟和测量，结果表明该系统能够在z坐标上连续、线性且快速地改变聚焦位置。作为演示，在曲率半径为32.77 mm的凸面K9玻璃基板表面上，在40 s内制造出了矢高为5.2 mm、设计线宽/间距为12.5 μm/25 μm的同心圆光刻胶光栅。当与x-y-z平台的移动相结合时，该系统能够在更大尺寸的曲面上制造微图案。此外，该系统具备用于微米级精度3D微制造的光学、力学和自动化的一般原理。
