Cai Hongbing, Meng Qiushi, Ding Huaiyi, Zhang Kun, Lin Yue, Ren Wenzhen, Yu Xinxin, Wu Yukun, Zhang Guanghui, Li Mingling, Pan Nan, Qi Zeming, Tian Yangchao, Luo Yi, Wang Xiaoping
Hefei National Laboratory for Physical Sciences at the Microscale & Synergetic Innovation Center of Quantum Information & Quantum Physics , University of Science and Technology of China , Hefei Anhui 230026 , China.
USTC Center for Micro- and Nanoscale Research and Fabrication , University of Science and Technology of China , Hefei Anhui 230026 , China.
ACS Nano. 2018 Sep 25;12(9):9626-9632. doi: 10.1021/acsnano.8b06534. Epub 2018 Sep 10.
The limited ability to fabricate nanostructures on nonplanar rugged surfaces has severely hampered the applicability of many emerging technologies. Here we report a resist stencil lithography based approach for in situ fabrication of multidimensional nanostructures on both planar and uneven substrates. By using the resist film as a flexible stencil to form a suspending membrane with predesigned patterns, a variety of nanostructures have been fabricated on curved or uneven substrates of diverse morphologies on demand. The ability to realize 4 in. wafer scale fabrication of nanostructures as well as line width resolution of sub-20 nm is also demonstrated. Its extraordinary capacity is highlighted by the fabrication of three-dimensional wavy nanostructures with diversified cell morphologies on substrates of different curvatures. A robust general scheme is also developed to construct various complex 3D nanostructures. The use of conventional resists and processing ensures the versatility of the method. Such an in situ lithography technique has offered exciting possibilities to construct nanostructures with high dimensionalities that can otherwise not be achieved with existing nanofabrication methods.
在非平面粗糙表面上制造纳米结构的能力有限，这严重阻碍了许多新兴技术的应用。在此，我们报告一种基于抗蚀剂模板光刻的方法，用于在平面和不平坦基板上原位制造多维纳米结构。通过使用抗蚀剂膜作为柔性模板来形成具有预先设计图案的悬浮膜，已根据需要在各种形态的弯曲或不平坦基板上制造了各种纳米结构。还展示了实现4英寸晶圆规模纳米结构制造以及亚20纳米线宽分辨率的能力。在不同曲率的基板上制造具有多样化细胞形态的三维波浪形纳米结构突出了其非凡的能力。还开发了一种稳健的通用方案来构建各种复杂的3D纳米结构。使用传统抗蚀剂和工艺确保了该方法的通用性。这种原位光刻技术为构建高维度纳米结构提供了令人兴奋的可能性，而这些结构是现有纳米制造方法无法实现的。
