Suppr超能文献

通过适应性实验室进化鉴定光滑念珠菌氧化应激耐受性的新遗传决定因素。

Identifying novel genetic determinants for oxidative stress tolerance in Candida glabrata via adaptive laboratory evolution.

作者信息

Huang Mian, Kao Katy C

机构信息

Artie McFerrin Department of Chemical Engineering, Texas A&M University, College Station, Texas.

出版信息

Yeast. 2018 Nov;35(11):605-618. doi: 10.1002/yea.3352. Epub 2018 Sep 25.

Abstract

Candida glabrata (C glabrata) is an important yeast of industrial and medical significance. Resistance to oxidative stress is an important trait affecting its robustness as a production host or virulence as a pathogenic agent, but current understanding of resistance mechanisms is still limited in this fungus. In this study, we rapidly evolved C glabrata population to adapt to oxidative challenge (from 80mM to 350mM of H O ) through short-term adaptive laboratory evolution. Adaptive mutants were isolated from evolved populations and subjected to phenotypic and omics analyses to identify potential mechanisms of tolerance to H O . Phenotypic characterizations revealed faster detoxification of H O and ability to initiate growth at a higher concentration of the oxidant in the isolated adaptive mutants compared with the wild type. Genome resequencing and genome-wide transcriptome analysis revealed multiple genetic determinants (eg, CAGL0E01243g, CAGL0F06831g, and CAGL0C00385g) that potentially contribute to enhanced H O resistance. Subsequent experimental verification confirmed that CgCth2 (CAGL0E01243g) and CgMga2 (CAGL0F06831g) are important in C glabrata tolerance to oxidative stress. Transcriptome profiling of adaptive mutants and bioinformatic analysis suggest that NADPH regeneration, modulation of membrane composition, cell wall remodeling, and/or global regulatory changes are involved in C glabrata tolerance to H O .

摘要

光滑念珠菌(C. glabrata)是一种具有重要工业和医学意义的酵母。对氧化应激的抗性是影响其作为生产宿主的稳健性或作为病原体的毒力的重要特性,但目前对该真菌抗性机制的了解仍然有限。在本研究中,我们通过短期适应性实验室进化使光滑念珠菌群体快速进化以适应氧化挑战(从80mM到350mM的H₂O₂)。从进化群体中分离出适应性突变体,并对其进行表型和组学分析,以确定对H₂O₂耐受性的潜在机制。表型特征显示,与野生型相比,分离出的适应性突变体对H₂O₂的解毒速度更快,并且能够在更高浓度的氧化剂中开始生长。基因组重测序和全基因组转录组分析揭示了多个可能有助于增强对H₂O₂抗性的遗传决定因素(例如,CAGL0E01243g、CAGL0F06831g和CAGL0C00385g)。随后的实验验证证实,CgCth2(CAGL0E01243g)和CgMga2(CAGL0F06831g)在光滑念珠菌对氧化应激的耐受性中起重要作用。适应性突变体的转录组分析和生物信息学分析表明,NADPH再生、膜组成的调节、细胞壁重塑和/或全局调控变化参与了光滑念珠菌对H₂O₂的耐受性。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验