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自组装嵌段共聚物光刻图形化 L1-FePt 纳米点的热稳定性。

Thermal stability of L1-FePt nanodots patterned by self-assembled block copolymer lithography.

机构信息

Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, MA 02139, United States of America. BCMaterials, Basque Center for Materials, Applications and Nanostructures, UPV/EHU Science Park, 48940 Leioa, Spain.

出版信息

Nanotechnology. 2018 Nov 16;29(46):465301. doi: 10.1088/1361-6528/aade2f. Epub 2018 Aug 31.

Abstract

Arrays of 14 nm thick L1-FePt nanodots with diameter of 27 nm and center-to-center spacing of 39 nm were produced by block copolymer patterning of an FePt film and their magnetic reversal and thermal stability were characterized. A self-assembled polystyrene-b-polydimethylsiloxane diblock copolymer film was used as a lithographic mask and a pattern transfer process based on ion beam etching and rapid thermal annealing of the sputtered FePt film was developed. The dot arrays exhibited perpendicular magnetic anisotropy with K = 4.8 × 10 erg cm and a saturation magnetization of 960 emu cm. First order reversal curves indicate a softer magnetic component attributed to the ion-milled material at the edges of the dots. The switching volume and the thermal stability were obtained from relaxation measurements and DC demagnetization curves. Micromagnetic simulations reproduce the magnetic domain structure obtained for the continuous and patterned FePt thin film.

摘要

采用嵌段共聚物对 FePt 薄膜进行图案化,制备了直径为 27nm、中心间距为 39nm 的 14nm 厚 L1-FePt 纳米点阵列,并对其磁反转和热稳定性进行了表征。采用自组装聚苯乙烯-聚二甲基硅氧烷嵌段共聚物薄膜作为光刻掩模,并开发了基于离子束刻蚀和溅射 FePt 薄膜快速热退火的图案转移工艺。点阵列表现出垂直各向异性磁各向异性,K=4.8×10 erg cm,饱和磁化强度为 960emu cm。一级反转曲线表明,由于边缘离子铣削材料的存在,存在较软的磁性分量。通过弛豫测量和直流退磁曲线获得了开关体积和热稳定性。微磁模拟再现了连续和图案化 FePt 薄膜的磁畴结构。

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