J Adhes Dent. 2018;20(4):289-297. doi: 10.3290/j.jad.a40986.
To evaluate the influence of contamination and plasma treatment on the bond strength of resin to zirconia ceramic.
After immersion in saliva or the use of a silicone disclosing agent, polished and airborne-particle abraded zirconia specimens were cleaned either ultrasonically in 99% isopropanol or with nonthermal plasma. Uncontaminated zirconia specimens were used as control. For chemical analysis, specimens of all groups were examined with x-ray photoelectron spectroscopy (XPS). Plexiglas tubes filled with composite resin were bonded to ceramic specimens with a phosphate-monomer-containing luting resin. The influence of contamination and cleaning methods on ceramic bond durability was examined by tensile testing after 3 and 150 days of water storage, with an additional 37,500 thermocycles during the 150-day storage.
XPS showed an increase in the amount of oxygen and a decrease in the amount of carbon on the zirconia surface after plasma treatment. After contamination with silicone, XPS revealed a high amount of Si residue on the surface that none of the investigated cleaning processes could completely remove. The tensile bond strength to uncontaminated zirconia ceramic was durable, but was significantly reduced by contamination.
Plasma treatment was effective in removing salivary contamination but not silicone disclosing agent residue from the bonding surface of zirconia.
评估污染和等离子体处理对树脂与氧化锆陶瓷粘结强度的影响。
将抛光和喷丸处理后的氧化锆试件浸入唾液或使用硅橡胶显影剂后，分别用 99%异丙醇超声清洗或非热等离子体清洗。未污染的氧化锆试件作为对照。对所有组别的试件进行 X 射线光电子能谱（XPS）化学分析。将填充有复合树脂的有机玻璃管用含磷酸单体的粘结树脂粘结到陶瓷试件上。通过在水储存 3 天和 150 天后进行拉伸试验，以及在 150 天储存期间进行额外的 37,500 次热循环，检查污染和清洁方法对陶瓷粘结耐久性的影响。
XPS 显示，等离子体处理后氧化锆表面的氧含量增加，碳含量减少。在被硅橡胶污染后，XPS 显示表面有大量的 Si 残留，而所有研究的清洁过程都无法完全去除。与未污染的氧化锆陶瓷的拉伸粘结强度是持久的，但被污染显著降低。
等离子体处理可有效去除氧化锆粘结表面的唾液污染，但不能去除硅橡胶显影剂残留。
