Zhang Feng, Yu Kun, Zhang Kaihua, Liu Yanlei, Zhao Yuejin, Liu Yufang
1 School of Optoelectronics, Beijing Institute of Technology, Beijing, China.
2 Infrared Optoelectronic Science and Technology Key Laboratory of Henan province, College of Physics and Electrical Engineering, Henan Normal University, Xinxiang Henan, China.
Appl Spectrosc. 2016 Oct;70(10):1717-1725. doi: 10.1177/0003702816644757. Epub 2016 Oct 7.
The normal infrared (IR) spectral emissivity of pure titanium TA1 is experimentally investigated using a self-designed emissivity measurement apparatus. The apparatus and the measurement method are described in detail. Seven samples are treated with abrasive paper to obtain the roughness needed. The emissivity of one sample is obtained between 473 and 1035 K with wavelength range of 3-27 µm in an argon environment. The other six samples are oxidized at a high temperature (873 K) for various times. The surface roughness and composition of the samples are analyzed using roughness tester and X-ray diffraction before and after the emissivity measurement. The results show that the spectral emissivity of titanium sample increases with the increase of temperature and decreases with the increase of wavelength from 3 to 27 µm. For the oxidized samples, the spectral emissivity increases with increasing oxidization time, and after being heated for 12 h, the emissivity values increase slightly. The influence of the oxide film thickness on the spectral emissivity is discussed based on interference theory, and the thickness of oxide film with different oxidation time is accurately measured using scanning electron microscope.
采用自行设计的发射率测量装置，对纯钛TA1的正常红外（IR）光谱发射率进行了实验研究。详细描述了该装置和测量方法。用砂纸处理七个样品以获得所需的粗糙度。在氩气环境中，在波长范围为3 - 27μm、温度为473至1035K的条件下获得了一个样品的发射率。另外六个样品在高温（873K）下氧化不同时间。在发射率测量前后，使用粗糙度测试仪和X射线衍射对样品的表面粗糙度和成分进行了分析。结果表明，钛样品的光谱发射率随温度升高而增加，在3至27μm波长范围内随波长增加而降低。对于氧化样品，光谱发射率随氧化时间增加而增加，加热12小时后，发射率值略有增加。基于干涉理论讨论了氧化膜厚度对光谱发射率的影响，并使用扫描电子显微镜精确测量了不同氧化时间下氧化膜的厚度。
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