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是什么限制了二维金属二硫属化物中电子和空穴的本征迁移率?

What Limits the Intrinsic Mobility of Electrons and Holes in Two Dimensional Metal Dichalcogenides?

作者信息

Cheng Long, Liu Yuanyue

机构信息

Texas Materials Institute and Department of Mechanical Engineering , The University of Texas at Austin , Austin , Texas 78712 , United States.

出版信息

J Am Chem Soc. 2018 Dec 26;140(51):17895-17900. doi: 10.1021/jacs.8b07871. Epub 2018 Oct 5.

Abstract

Two-dimensional (2D) metal dichalcogenides (MX) are the most common type of 2D semiconductors and have shown great potential for a wide range of chemical and physical applications. However, they are limited by a low electron/hole mobility, which has been recognized as one of the major challenges impeding their further developments, and urges efforts to understand the mobility-limiting factors and discovery of higher-mobility alternatives. Here using density functional perturbation theory and Wannier interpolation of the electron-phonon matrix to study a wide range of MX, we find that the intrinsic carrier mobility, in contrast to common belief, neither correlates with the effective mass nor can be assessed by the widely used deformation potential theory; instead it is limited by the longitudinal optical (LO) phonon scattering for most MX, while for MoS and WS, the mobility is limited by the longitudinal acoustic (LA) phonon scattering. Furthermore, we find that the LO scattering strength is strongly correlated with the magnitude of the Born effective charge, suggesting that the carrier transport is greatly affected by the electric polarization change induced by the atomic vibration. This finding enables us to use the Born effective charge to rapidly screen the 2D MX database for high-mobility semiconductor candidates. Our work reveals the underlying factors governing the intrinsic carrier mobility of 2D MX, offers a practical descriptor for discovering high-mobility candidates, and serves as a paradigm to accurately assess the carrier mobility in 2D semiconductors, thereby paving critical steps toward the development of 2D materials.

摘要

二维(2D)金属二硫属化物(MX)是最常见的二维半导体类型,在广泛的化学和物理应用中显示出巨大潜力。然而,它们受到低电子/空穴迁移率的限制,这已被认为是阻碍其进一步发展的主要挑战之一,并促使人们努力了解迁移率限制因素并发现更高迁移率的替代材料。在这里,我们使用密度泛函微扰理论和电子 - 声子矩阵的万尼尔插值法来研究多种MX,我们发现,与普遍看法相反,本征载流子迁移率既不与有效质量相关,也不能通过广泛使用的形变势理论来评估;相反,对于大多数MX,它受到纵向光学(LO)声子散射的限制,而对于MoS和WS,迁移率则受到纵向声学(LA)声子散射的限制。此外,我们发现LO散射强度与玻恩有效电荷的大小密切相关,这表明载流子输运受到原子振动引起的电极化变化的极大影响。这一发现使我们能够利用玻恩有效电荷快速筛选二维MX数据库以寻找高迁移率半导体候选材料。我们的工作揭示了控制二维MX本征载流子迁移率的潜在因素,为发现高迁移率候选材料提供了一个实用的描述符,并作为准确评估二维半导体中载流子迁移率的范例,从而为二维材料的发展迈出了关键步骤。

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