Suppr超能文献

由于 Ge 和 C 在 SbTe 基高速相变存储中的掺杂,表现出了极好的热稳定性。

Excellent thermal stability owing to Ge and C doping in SbTe-based high-speed phase-change memory.

机构信息

State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, People's Republic of China. Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, People's Republic of China. University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China.

出版信息

Nanotechnology. 2018 Dec 14;29(50):505710. doi: 10.1088/1361-6528/aae4f4. Epub 2018 Sep 28.

Abstract

The contradictory nature between transition speed and thermal stability of phase-change materials has always been the key limitation to the achievement of wide applications under harsh conditions. GeSbTe phase-change alloy is proposed here to feature high thermal stability (10 year data retention above 220 °C) and fast switching speed (SET programming speed up to 5 ns) for electronic storage. In mushroom-shaped device cells, the nanocomposite materials implement an endurance life of nearly 1 × 10 cycles. Such operation speed among high-temperature alloys is the best ever reported. And the moderate incorporation of C offers intriguing benefits that include enhanced thermal stability and reduced RESET voltage in the above-mentioned Ge-rich SbTe-based memory cells. Through microscopic analysis, the local segregation of C dopants can further refine the crystalline grains and thus induce a lower volume change and roughness upon heating. These properties are crucial with regard to the application potential in high-performance and high-density embedded memories.

摘要

相变材料的转变速度和热稳定性之间的矛盾一直是在苛刻条件下实现广泛应用的关键限制。本研究提出了 GeSbTe 相变合金,具有高的热稳定性(在 220°C 以上的数据保持时间超过 10 年)和快速的开关速度(SET 编程速度高达 5ns),可用于电子存储。在蘑菇状器件单元中,纳米复合材料实现了近 1×10^6 次的循环寿命。这种高温合金中的操作速度是迄今为止报道的最佳速度。并且,适度掺入 C 可以提供有趣的好处,包括增强的热稳定性和降低上述富 Ge SbTe 基存储单元的 RESET 电压。通过微观分析,C 掺杂剂的局部偏析可以进一步细化晶粒,从而在加热时引起较小的体积变化和粗糙度。这些特性对于高性能和高密度嵌入式存储器的应用潜力至关重要。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验