State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology , Chinese Academy of Sciences , Shanghai 200050 , China.
University of the Chinese Academy of Sciences , Beijing 100080 , People's Republic of China.
ACS Appl Mater Interfaces. 2019 Feb 6;11(5):5336-5343. doi: 10.1021/acsami.8b18473. Epub 2019 Jan 24.
Phase change memory is widely considered as the most promising candidate as storage class memory (SCM), bridging the performance gaps between dynamic random access memory and flash. However, high required operation current remains the major limitation for the SCM application, even after using defect engineering materials, for example, Ti-doped SbTe. Here, we demonstrate that ∼87% current can be reduced by spatially separating SbTe and TiTe layers, thanks to semimetallic TiTe serving as a thermal barrier in the reset process. Moreover, the stable crystalline TiTe layer provides an ordered interface to speed up the crystallization process of the amorphous SbTe layer, enabling ∼10 ns ultrafast crystallization speed. An outstanding device lifetime, up to ∼2 × 10 cycles, has been obtained, which is twice as long as that of alloy-based cells. Correlative electron microscopy and atom probe tomography provide evidence that the TiTe/SbTe multilayer can keep a layer-stacked structure, avoiding phase segregation found in alloys and strong element intermixing in the GeTe/SbTe superlattice, which enables excellent cyclability. This study suggests that adding a semimetallic layer in the phase change layer, such as TiTe and TiSe, can yield a phase change memory with superior properties.
相变存储器被广泛认为是最有前途的存储级存储器 (SCM) 候选者,它可以弥合动态随机存取存储器和闪存之间的性能差距。然而,即使使用了缺陷工程材料(例如,掺钛的 SbTe),高所需操作电流仍然是 SCM 应用的主要限制。在这里,我们证明通过空间分离 SbTe 和 TiTe 层,可以将电流降低约 87%,这要归功于在重置过程中作为热障的半金属 TiTe。此外,稳定的结晶 TiTe 层提供了一个有序的界面,以加快非晶 SbTe 层的结晶过程,实现了约 10 ns 的超快结晶速度。获得了出色的器件寿命,高达约 2×10 次循环,是基于合金的单元的两倍。相关电子显微镜和原子探针断层扫描提供了证据,表明 TiTe/SbTe 多层可以保持层堆叠结构,避免了在合金中发现的相分离和在 GeTe/SbTe 超晶格中发现的强烈元素混合,从而实现了优异的循环性能。这项研究表明,在相变层中添加半金属层,如 TiTe 和 TiSe,可以获得具有优异性能的相变存储器。