Zhang Jie, Rong Ningning, Xu Peng, Xiao Yuchen, Lu Aijiang, Song Wenxiong, Song Sannian, Song Zhitang, Liang Yongcheng, Wu Liangcai
College of Science, Donghua University, Shanghai 201620, China.
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.
Nanomaterials (Basel). 2023 Feb 9;13(4):671. doi: 10.3390/nano13040671.
As a new generation of non-volatile memory, phase change random access memory (PCRAM) has the potential to fill the hierarchical gap between DRAM and NAND FLASH in computer storage. SbTe, one of the candidate materials for high-speed PCRAM, has high crystallization speed and poor thermal stability. In this work, we investigated the effect of carbon doping on SbTe. It was found that the FCC phase of C-doped SbTe appeared at 200 °C and began to transform into the HEX phase at 25 °C, which is different from the previous reports where no FCC phase was observed in C-SbTe. Based on the experimental observation and first-principles density functional theory calculation, it is found that the formation energy of FCC-SbTe structure decreases gradually with the increase in C doping concentration. Moreover, doped C atoms tend to form C molecular clusters in sp hybridization at the grain boundary of SbTe, which is similar to the layered structure of graphite. And after doping C atoms, the thermal stability of SbTe is improved. We have fabricated the PCRAM device cell array of a C-SbTe alloy, which has an operating speed of 5 ns, a high thermal stability (10-year data retention temperature 138.1 °C), a low device power consumption (0.57 pJ), a continuously adjustable resistance value, and a very low resistance drift coefficient.
作为新一代非易失性存储器,相变随机存取存储器(PCRAM)有潜力填补计算机存储中动态随机存取存储器(DRAM)和闪存(NAND FLASH)之间的层级差距。高速PCRAM的候选材料之一碲化锑(SbTe)具有高结晶速度,但热稳定性较差。在本工作中,我们研究了碳掺杂对SbTe的影响。发现碳掺杂的SbTe的面心立方(FCC)相在200℃出现,并在25℃开始转变为六方(HEX)相,这与之前在碳-碲化锑(C-SbTe)中未观察到FCC相的报道不同。基于实验观察和第一性原理密度泛函理论计算,发现FCC-SbTe结构的形成能随着碳掺杂浓度的增加而逐渐降低。此外,掺杂的碳原子倾向于在SbTe的晶界处以sp杂化形成C分子簇,这类似于石墨的层状结构。并且在掺杂碳原子后,SbTe的热稳定性得到了提高。我们制备了碳-碲化锑合金的PCRAM器件单元阵列,其具有5纳秒的工作速度、高热稳定性(10年数据保持温度138.1℃)、低器件功耗(0.57皮焦)、连续可调的电阻值以及非常低的电阻漂移系数。