Bockrath R, Wolff L, Farr A, Crouch R J
Genetics. 1987 Jan;115(1):33-40. doi: 10.1093/genetics/115.1.33.
Strains of E. coli B/r transformed with the plasmid pSK760 were found to be sensitized to inactivation by ultraviolet radiation (UV) and to have elevated levels of RNase H activity. Strains transformed with the carrier vector pBR322 or the plasmid pSK762C derived from pSK760 but with an inactivated rnh gene were not sensitized. UV-inactivation data for strains having known defects in DNA repair and transformed with pSK760 suggested an interference by RNase H of postreplication repair: uvrA cells were strongly sensitized, wild-type and uvrA recF cells were moderately sensitized and recA cells were not sensitized; and minimal medium recovery was no longer apparent in sensitized uvrA cells. Biochemical studies showed that post-UV DNA synthesis was sensitized and that the smaller amounts of DNA synthesized after irradiation, while of normal reduced size as indicated by sedimentation position in alkaline sucrose gradients, did not shift to a larger size (more rapidly sedimenting) upon additional incubation. We suggest an excess level of RNase H interferes with reinitiation of DNA synthesis on damaged templates to disturb the normal pattern of daughter strand gaps and thereby to inhibit postreplication repair.
用质粒pSK760转化的大肠杆菌B/r菌株对紫外线(UV)灭活敏感,且核糖核酸酶H(RNase H)活性水平升高。用载体质粒pBR322或源自pSK760但rnh基因失活的质粒pSK762C转化的菌株则不敏感。对已知DNA修复存在缺陷且用pSK760转化的菌株进行的紫外线灭活数据表明,RNase H干扰了复制后修复:uvrA细胞高度敏感,野生型和uvrA recF细胞中度敏感,recA细胞不敏感;在敏感的uvrA细胞中,基本培养基中的恢复现象不再明显。生化研究表明,紫外线照射后的DNA合成敏感,照射后合成的少量DNA,虽然在碱性蔗糖梯度中的沉降位置表明其大小正常减小,但在进一步孵育后并未转变为更大的大小(沉降更快)。我们认为,过量的RNase H会干扰受损模板上DNA合成的重新起始,从而扰乱子链缺口的正常模式,进而抑制复制后修复。