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硅烯:一种新型硅的同素异形体。

t-Si : A Novel Silicon Allotrope.

机构信息

School of Information and Control Engineering, Xi'an University of Architecture and Technology, Xi'an, 710055, People's Republic of China.

Xidian University, Xi'an, Xi'an, 710071, People's Republic of China.

出版信息

Chemphyschem. 2019 Jan 7;20(1):128-133. doi: 10.1002/cphc.201800903. Epub 2018 Nov 28.

Abstract

Utilizing first principle calculations, a novel Si silicon allotrope in the I4 /amd space group with tetragonal symmetry (denoted as t-Si below) is proposed in this work. In addition, also its structural, anisotropic mechanical, and electronic properties along with its minimum thermal conductivity κ were predicted. The mechanical and thermodynamic stability of t-Si were evaluated by means of elastic constants and phonon spectra. The electronic band structure indicates that t-Si is an indirect band gap semiconductor with a band gap: 0.67 eV (primitive cell) compared to a direct band gap of 0.70 eV with respect to a conventional cell. The minimum thermal conductivity of t-Si (0.74 W cm K ) is much smaller than that of diamond silicon (1.13 W cm  K ). Therefore, Si-Ge alloys in the I4 /amd space group are potential thermoelectric materials.

摘要

本工作利用第一性原理计算,提出了一种具有四方对称性的 I4 /amd 空间群的新型硅同素异形体(下文简称 t-Si)。此外,还预测了其各向异性力学和电子性质以及最低热导率κ。通过弹性常数和声子谱评估了 t-Si 的力学和热力学稳定性。电子能带结构表明,t-Si 是间接带隙半导体,带隙为 0.67 eV(原胞),相比之下,常规胞的带隙为 0.70 eV,为直接带隙。t-Si 的最低热导率(0.74 W cm K )远小于金刚石硅(1.13 W cm K )。因此,I4 /amd 空间群中的 Si-Ge 合金是潜在的热电材料。

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