Li Junhui, Xia Yang, Wang Wei, Wang Fuliang, Zhang Wei, Zhu Wenhui
School of Mechanical and Electronical Engineering and State Key Laboratory of High Performance Complex Manufacturing, Central South University, Changsha, 410083 People's Republic of China.
Nanomicro Lett. 2015;7(1):1-11. doi: 10.1007/s40820-014-0012-6. Epub 2014 Dec 2.
The dipping process was recorded firstly by high-speed camera system; acceleration time, speed, and dipping time were set by the control system of dipping bed, respectively. By image processing of dipping process based on Otsu's method, it was found that low-viscosity flux glue eliminates the micelle effectively, very low speed also leads to small micelle hidden between the bumps, and this small micelle and hidden phenomenon disappeared when the speed is ≥0.2 cm s. Dipping flux quantity of the bump decreases by about 100 square pixels when flux viscosity is reduced from 4,500 to 3,500 mpa s. For the 3,500 mpa s viscosity glue, dipping flux quantity increases with the increase of the speed and decreases with the increase of the speed after the speed is up to 0.8 cm s. The stable time of dipping glue can be obtained by real-time curve of dipping flux quantity and is only 80-90 ms when dipping speed is from 1.6 to 4.0 cm s. Dipping flux quantity has an increasing trend for acceleration time and has a decreasing trend for acceleration. Dipping flux quantity increases with the increase of dipping time, and is becoming saturated when the time is ≥55 ms.
首先通过高速摄像系统记录浸渍过程;浸渍床的控制系统分别设置加速时间、速度和浸渍时间。通过基于大津法的浸渍过程图像处理发现,低粘度助焊剂胶能有效消除胶束,极低的速度也会导致 bumps 之间隐藏有小胶束,当速度≥0.2 cm/s 时,这种小胶束和隐藏现象消失。当助焊剂粘度从 4500 降至 3500 mPa·s 时,bump 的浸渍助焊剂数量减少约 100 平方像素。对于粘度为 3500 mPa·s 的胶水,浸渍助焊剂数量随速度增加而增加,速度达到 0.8 cm/s 后随速度增加而减少。浸渍胶的稳定时间可通过浸渍助焊剂数量的实时曲线获得,当浸渍速度为 1.6 至 4.0 cm/s 时,稳定时间仅为 80 - 90 ms。浸渍助焊剂数量在加速时间有增加趋势,在加速过程中有减少趋势。浸渍助焊剂数量随浸渍时间增加而增加,当时间≥55 ms 时趋于饱和。