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用于MEMS器件倒装芯片的新型一级互连技术。

Novel First-Level Interconnect Techniques for Flip Chip on MEMS Devices.

作者信息

Sutanto Jemmy, Anand Sindhu, Patel Chetan, Muthuswamy Jit

机构信息

School of Biological and Health Systems Engineering, Arizona State University, Tempe, AZ 85287-9709 USA.

出版信息

J Microelectromech Syst. 2011 Nov 3;21(1):132-144. doi: 10.1109/JMEMS.2011.2171326.

Abstract

Flip-chip packaging is desirable for microelectro-mechanical systems (MEMS) devices because it reduces the overall package size and allows scaling up the number of MEMS chips through 3-D stacks. In this report, we demonstrate three novel techniques to create first-level interconnect (FLI) on MEMS: 1) Dip and attach technology for Ag epoxy; 2) Dispense technology for solder paste; 3) Dispense, pull, and attach technology (DPAT) for solder paste. The above techniques required no additional microfabrication steps, produced no visible surface contamination on the MEMS active structures, and generated high-aspect-ratio interconnects. The developed FLIs were successfully tested on MEMS moveable microelectrodes microfabricated by SUMMiTV process producing no apparent detrimental effect due to outgassing. The bumping processes were successfully applied on Al-deposited bond pads of 100 m 100 m with an average bump height of 101.3 m for Ag and 184.8 m for solder (63Sn, 37Pb). DPAT for solder paste produced bumps with the aspect ratio of 1.8 or more. The average shear strengths of Ag and solder bumps were 78 MPa and 689 kPa, respectively. The electrical test on Ag bumps at 794 A/cm demonstrated reliable electrical interconnects with negligible resistance. These scalable FLI technologies are potentially useful for MEMS flip-chip packaging and 3-D stacking.

摘要

倒装芯片封装对于微机电系统(MEMS)器件来说是理想的,因为它减小了整体封装尺寸,并允许通过三维堆叠增加MEMS芯片的数量。在本报告中,我们展示了三种在MEMS上创建一级互连(FLI)的新技术:1)用于银环氧树脂的浸涂和附着技术;2)用于焊膏的点涂技术;3)用于焊膏的点涂、拉伸和附着技术(DPAT)。上述技术不需要额外的微加工步骤,不会在MEMS有源结构上产生可见的表面污染,并且能生成高纵横比的互连。所开发的FLI在通过SUMMiTV工艺微制造的MEMS可移动微电极上成功进行了测试,未因放气而产生明显的有害影响。凸点工艺成功应用于尺寸为100μm×100μm且镀铝的键合焊盘上,银凸点的平均高度为101.3μm,焊料(63Sn,37Pb)凸点的平均高度为184.8μm。用于焊膏的DPAT工艺产生的凸点纵横比为1.8或更高。银凸点和焊料凸点的平均剪切强度分别为78MPa和689kPa。在794A/cm电流下对银凸点进行的电气测试表明,其具有可靠的电气互连,电阻可忽略不计。这些可扩展的FLI技术对于MEMS倒装芯片封装和三维堆叠可能具有潜在的用途。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2f7d/3913265/5a19ff02a3b4/nihms-540984-f0001.jpg

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