• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

溶液法制备的氧化铟薄膜晶体管的电学稳定性

Electrical Stability of Solution-Processed Indium Oxide Thin-Film Transistors.

作者信息

Lee Hyeonju, Kwon Jin-Hyuk, Bae Jin-Hyuk, Park Jaehoon, Seo Cheonghoon

机构信息

Department of Electronic Engineering, Hallym University, Chuncheon 24252, Korea.

School of Electronics, Kyungpook National University, Daegu 41566, Korea.

出版信息

J Nanosci Nanotechnol. 2019 Apr 1;19(4):2371-2374. doi: 10.1166/jnn.2019.16005.

DOI:10.1166/jnn.2019.16005
PMID:30487002
Abstract

We investigated the electrical stability of bottom-gate/top-contact-structured indium oxide (In₂O₃) thin-film transistors (TFTs) in atmospheric air and under vacuum. The solution-processed In₂O₃ film exhibits a nanocrystalline morphology with grain boundaries. The fabricated In₂O₃ TFTs operate in an -type enhancement mode. Over repeated TFT operation under vacuum, the TFTs exhibit a slight increase in the field-effect mobility, possibly due to multiple instances of the "trapping and release" behavior of electrons at grain boundaries. On the other hand, a decrease in the fieldeffect mobility and an increase in the hysteresis are observed as the measurement continues in atmospheric air. These results suggest that the electrical stability of solution-processed In₂O₃ TFTs is significantly affected by the electron-trapping phenomenon at crystal grain boundaries in the In₂O₃ semiconductor and the electrostatic interactions between electrons and polar water molecules.

摘要

我们研究了底栅/顶接触结构的氧化铟(In₂O₃)薄膜晶体管(TFT)在大气和真空环境下的电学稳定性。通过溶液处理制备的In₂O₃薄膜呈现出具有晶界的纳米晶体形态。所制备的In₂O₃ TFT以n型增强模式工作。在真空环境下重复进行TFT操作时,TFT的场效应迁移率略有增加,这可能是由于电子在晶界处多次发生“捕获和释放”行为所致。另一方面,在大气环境中持续测量时,会观察到场效应迁移率降低以及滞后现象增加。这些结果表明,溶液处理的In₂O₃ TFT的电学稳定性受到In₂O₃半导体中晶粒边界处的电子捕获现象以及电子与极性水分子之间的静电相互作用的显著影响。

相似文献

1
Electrical Stability of Solution-Processed Indium Oxide Thin-Film Transistors.溶液法制备的氧化铟薄膜晶体管的电学稳定性
J Nanosci Nanotechnol. 2019 Apr 1;19(4):2371-2374. doi: 10.1166/jnn.2019.16005.
2
Investigation of the Electrical Characteristics of Bilayer ZnO/In₂O₃ Thin-Film Transistors Fabricated by Solution Processing.溶液法制备双层ZnO/In₂O₃薄膜晶体管的电学特性研究
Materials (Basel). 2018 Oct 26;11(11):2103. doi: 10.3390/ma11112103.
3
Self-Aligned Top-Gate Metal-Oxide Thin-Film Transistors Using a Solution-Processed Polymer Gate Dielectric.使用溶液处理聚合物栅极电介质的自对准顶栅金属氧化物薄膜晶体管。
Micromachines (Basel). 2020 Nov 25;11(12):1035. doi: 10.3390/mi11121035.
4
Improved electrical performance and bias stability of solution-processed active bilayer structure of indium zinc oxide based TFT.基于铟锌氧化物的薄膜晶体管溶液处理有源双层结构的电学性能和偏置稳定性得到改善。
ACS Appl Mater Interfaces. 2014 Sep 10;6(17):15335-43. doi: 10.1021/am5037934. Epub 2014 Aug 20.
5
Low-Concentration Indium Doping in Solution-Processed Zinc Oxide Films for Thin-Film Transistors.用于薄膜晶体管的溶液法氧化锌薄膜中的低浓度铟掺杂
Materials (Basel). 2017 Jul 31;10(8):880. doi: 10.3390/ma10080880.
6
Preparation and Characterization of Solution-Processed Nanocrystalline p-Type CuAlO Thin-Film Transistors.溶液法制备的纳米晶p型CuAlO薄膜晶体管的制备与表征
Nanoscale Res Lett. 2018 Aug 30;13(1):259. doi: 10.1186/s11671-018-2680-5.
7
Effective Atmospheric-Pressure Plasma Treatment toward High-Performance Solution-Processed Oxide Thin-Film Transistors.有效大气压等离子体处理实现高性能溶液法制备的氧化物薄膜晶体管。
ACS Appl Mater Interfaces. 2018 Sep 12;10(36):30581-30586. doi: 10.1021/acsami.8b11111. Epub 2018 Aug 31.
8
Multimode Operation of Organic-Inorganic Hybrid Thin-Film Transistors Based on Solution-Processed Indium Oxide Films.基于溶液处理氧化铟薄膜的有机-无机混合薄膜晶体管的多模操作
ACS Appl Mater Interfaces. 2021 Sep 15;13(36):43051-43062. doi: 10.1021/acsami.1c10982. Epub 2021 Sep 3.
9
Atmospheric-pressure plasma treatment toward high-quality solution-processed aluminum oxide gate dielectric films in thin-film transistors.在薄膜晶体管中,通过常压等离子体处理实现高质量溶液法制备的氧化铝栅介质薄膜。
Nanotechnology. 2019 Dec 6;30(49):495702. doi: 10.1088/1361-6528/ab4073. Epub 2019 Sep 2.
10
Effects of Iodine Doping on Electrical Characteristics of Solution-Processed Copper Oxide Thin-Film Transistors.碘掺杂对溶液法制备的氧化铜薄膜晶体管电学特性的影响
Materials (Basel). 2021 Oct 15;14(20):6118. doi: 10.3390/ma14206118.

引用本文的文献

1
Effect of annealing temperature on the electrical properties of IZO TFTs.退火温度对铟锌氧化物薄膜晶体管电学性能的影响。
RSC Adv. 2025 May 16;15(21):16445-16454. doi: 10.1039/d5ra02132d. eCollection 2025 May 15.