Controlled TiO Growth on Reverse Osmosis and Nanofiltration Membranes by Atomic Layer Deposition: Mechanisms and Potential Applications.

Enhancing the chemical and physical properties of the polyamide active layer of thin-film composite (TFC) membranes by surface coating is a goal long-pursued. Atomic layer deposition (ALD) has been proposed as an innovative approach to deposit chemically robust metal oxides onto membrane surfaces due to its unique capability to control coating conformality and thickness with atomic scale precision. This study examined the potential to coat the surface of TFC reverse osmosis (RO) and nanofiltration (NF) membranes via ALD of TiO. Our results suggest that the optimal ALD conditions, the film growth kinetics, and the depth of deposition are different for RO and NF membranes due to the different diffusive transport of ALD precursors through the membrane pores. The TiO coating mainly located at the surface of the RO membrane; in contrast, the TiO coating extended to the depth of the NF membrane. The TiO coating degraded membrane water permeability and salt rejection beyond 10 cycles of ALD, the condition commonly employed in previous ALD-based membrane modification studies. Instead, this study showed that with fewer than 10 cycles, the TiO coating of RO membrane increased the membrane surface charge without negatively impacting water permeability and salt rejection. For the NF membranes, the coating of TiO inside their pores led to the tuning of pore sizes and increased the rejection of selected solutes.