Department of Medicine, Division of Cardiology, Section of Cardiac Electrophysiology, University of California San Francisco, San Francisco, California.
Abbott, Cardiac Arrhythmias, Chicago, Illinois.
J Cardiovasc Electrophysiol. 2019 Feb;30(2):183-192. doi: 10.1111/jce.13803. Epub 2018 Dec 21.
Ventricular arrhythmias (VA) after left ventricular assist device (LVAD) placement are associated with increased morbidity and mortality. We sought to assess epicardial voltage characteristics at the time of LVAD implantation and investigate relationships between scar burden and postimplant VA.
Consecutive patients underwent open chest epicardial electroanatomic mapping immediately before LVAD implantation. Areas of low voltage and sites with local abnormal potentials were identified. Patients were followed prospectively for postimplant VA and clinical outcomes. Between 2015 and 2017, 36 patients underwent high-density intraoperative epicardial voltage mapping; 15 had complete maps suitable for analysis. Mapping required a median of 11.8 (interquartile range [IQR], 8.5-12.7) minutes, with a median of 2650 (IQR, 2139-3191) points sampled per patient. Over a median follow-up of 311 (IQR, 168-469) postoperative days, four patients (27%) experienced sustained VA. Patients with postimplant VA were more likely to have had preimplant implantable cardioverter defibrillator shocks (100% vs 27%; P = 0.03), ventricular tachycardia storm (75% vs 9%; P = 0.03), and lower ejection fraction (13.5 vs 19.0%, P = 0.05). Patients with postimplant VA also had a significantly higher burden of epicardial low bipolar voltage points: 55.4% vs 24.9% of points were less than 0.5 mV (P = 0.01), and 88.9% vs 63.7% of points less than 1.5 mV (P = 0.004).
Intraoperative high-density epicardial mapping during LVAD implantation is safe and efficient, facilitating characterization of a potentially arrhythmogenic substrate. An increased burden of the epicardial scar may be associated with a higher incidence of postimplant VA. The role of empiric intraoperative epicardial ablation to mitigate risk of postimplant VA requires further study.
左心室辅助装置(LVAD)植入后发生室性心律失常(VA)与发病率和死亡率增加有关。我们旨在评估 LVAD 植入时心外膜电压特征,并研究瘢痕负担与植入后 VA 之间的关系。
连续患者在 LVAD 植入前立即进行开胸心外膜电解剖映射。确定低电压区域和局部异常电位部位。前瞻性随访患者植入后 VA 和临床结局。2015 年至 2017 年间,36 例患者接受了高密度术中心外膜电压映射;15 例有完整的图谱适合分析。映射平均需要 11.8 分钟(四分位距[IQR],8.5-12.7),每个患者平均采样 2650 个(IQR,2139-3191)点。在中位数为 311 天(IQR,168-469)的术后随访中,4 例患者(27%)发生持续性 VA。植入后发生 VA 的患者更有可能在植入前接受植入式心律转复除颤器电击(100%比 27%;P=0.03)、室性心动过速风暴(75%比 9%;P=0.03)和较低的射血分数(13.5%比 19.0%,P=0.05)。植入后发生 VA 的患者心外膜低双极电压点的负担也明显更高:小于 0.5 mV 的点有 55.4%(比 24.9%;P=0.01),小于 1.5 mV 的点有 88.9%(比 63.7%;P=0.004)。
LVAD 植入期间进行术中高密度心外膜映射是安全有效的,有助于描述潜在的致心律失常基质。心外膜瘢痕的负担增加可能与植入后 VA 的发生率增加有关。需要进一步研究经验性术中心外膜消融以降低植入后 VA 的风险。