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恶性疟原虫:通过体外持续药物暴露诱导克隆株对甲氟喹产生抗性。

Plasmodium falciparum: induction of resistance to mefloquine in cloned strains by continuous drug exposure in vitro.

作者信息

Oduola A M, Milhous W K, Weatherly N F, Bowdre J H, Desjardins R E

机构信息

Department of Parasitology and Laboratory Practice, School of Public Health, University of North Carolina, Chapel Hill 27514.

出版信息

Exp Parasitol. 1988 Dec;67(2):354-60. doi: 10.1016/0014-4894(88)90082-3.

Abstract

A genetically homogeneous population of Plasmodium falciparum prepared by a single erythrocyte micromanipulation technique was used to produce lines of P. falciparum resistant to mefloquine hydrochloride in vitro. Parasites were maintained in a culture medium containing gradually increased concentrations of mefloquine hydrochloride (CMP-mef) starting with 2 ng/ml. One of the mefloquine-resistant culture lines (W2-mef) was obtained after 96 weeks of continuous culture in CMP-mef, the last 4 weeks in medium containing 40 ng/ml of mefloquine hydrochloride. The W2-mef was four to six times more resistant to mefloquine than was the parent clone W2. Means of multiple determinations of 50% inhibitory concentrations (IC-50) of mefloquine hydrochloride against W2-mef and clone W2 were 20.39 +/- 5.08 ng/ml and 4.50 +/- 1.94 ng/ml, respectively.

摘要

通过单一红细胞显微操作技术制备的基因同质恶性疟原虫群体,被用于在体外产生对盐酸甲氟喹耐药的恶性疟原虫株系。寄生虫在含有逐渐增加浓度盐酸甲氟喹(CMP-甲氟喹)的培养基中培养,起始浓度为2纳克/毫升。在CMP-甲氟喹中连续培养96周后,获得了一个对甲氟喹耐药的培养株系(W2-甲氟喹),最后4周在含有40纳克/毫升盐酸甲氟喹的培养基中培养。W2-甲氟喹对甲氟喹的耐药性比亲本克隆W2高4至6倍。盐酸甲氟喹对W2-甲氟喹和克隆W2的50%抑制浓度(IC-50)的多次测定平均值分别为20.39±5.08纳克/毫升和4.50±1.94纳克/毫升。

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