Lizzit Daniel, Trioni Mario I, Bignardi Luca, Lacovig Paolo, Lizzit Silvano, Martinazzo Rocco, Larciprete Rosanna
Elettra-Sincrotrone Trieste S.C.p.A. , AREA Science Park , S.S. 14 km 163.5, 34149 Trieste , Italy.
CNR-Institute of Molecular Science and Technologies (ISTM) , Via Golgi 19 , 20133 Milano , Italy.
ACS Nano. 2019 Feb 26;13(2):1828-1838. doi: 10.1021/acsnano.8b07996. Epub 2019 Jan 22.
Nanostructured architectures based on graphene/metal interfaces might be efficiently exploited in hydrogen storage due to the attractive capability to provide adsorption sites both at the top side of graphene and at the metal substrate after intercalation. We combined in situ high-resolution X-ray photoelectron spectroscopy and scanning tunneling microscopy with theoretical calculations to determine the arrangement of hydrogen atoms at the graphene/Ni(111) interface at room temperature. Our results show that at low coverage H atoms predominantly adsorb as monomers and that chemisorption saturates when ∼25% of the surface is hydrogenated. In parallel, with a much lower rate, H atoms intercalate below graphene and bind to Ni surface sites. Intercalation progressively destabilizes the C-H bonds and triggers the release of the hydrogen chemisorbed on graphene. Valence band and near-edge absorption spectroscopy demonstrate that the graphene layer is fully lifted when the Ni surface is saturated with H. Thermal programmed desorption was used to determine the stability of the hydrogenated interface. Whereas the H atoms chemisorbed on graphene remain unperturbed over a wide temperature range, the intercalated phase abruptly desorbs 50-100 K above room temperature.
基于石墨烯/金属界面的纳米结构体系在储氢方面可能会得到有效应用,因为其具有吸引力的能力,即在插入后能在石墨烯的顶面和金属基底上都提供吸附位点。我们将原位高分辨率X射线光电子能谱和扫描隧道显微镜与理论计算相结合,以确定室温下石墨烯/Ni(111)界面处氢原子的排列。我们的结果表明,在低覆盖率下,H原子主要以单体形式吸附,当表面约25%被氢化时化学吸附达到饱和。同时,H原子以低得多的速率插入石墨烯下方并与Ni表面位点结合。插入逐渐使C-H键不稳定,并触发吸附在石墨烯上的氢的释放。价带和近边吸收光谱表明,当Ni表面被H饱和时,石墨烯层完全被抬起。程序升温脱附用于确定氢化界面的稳定性。虽然吸附在石墨烯上的H原子在很宽的温度范围内保持不变,但插入相在室温以上50-100K时突然脱附。