Lehrstuhl für Physikalische Chemie II, Universität Erlangen-Nürnberg, Egerlandstraße 3, D-91058 Erlangen, Germany.
J Phys Condens Matter. 2013 Nov 6;25(44):445002. doi: 10.1088/0953-8984/25/44/445002. Epub 2013 Sep 20.
The intercalation of a graphene layer adsorbed on a metal surface by gold or other metals is a standard procedure. While it was previously shown that pristine, i.e., undoped, and nitrogen-doped graphene sheets can be decoupled from a nickel substrate by intercalation with gold atoms in order to produce quasi-free-standing graphene, we find the gold intercalation behavior for boron-doped graphene on a Ni(111) surface to be more complex: for low boron contents (2-5%) in the graphene lattice only partial gold intercalation occurs and for higher boron contents (up to 20%) no intercalation is observed. In order to understand this different behavior, a density functional theory investigation is carried out, comparing undoped as well as substitutional nitrogen- and boron-doped graphene on Ni(111). We identify the stronger binding of the boron atoms to the nickel substrate as the factor responsible for the different intercalation behavior in the case of boron doping. However, the calculations predict that this energetic effect prevents the intercalation process only for large boron concentrations and that it can be overcome for smaller boron coverages, in line with our x-ray photoelectron spectroscopy experiments.
在金属表面吸附的石墨烯层通过金或其他金属插入进行夹层是一种标准程序。虽然以前已经表明,原始的,即未掺杂的和氮掺杂的石墨烯片可以通过与金原子的插入从镍基底上解耦,以产生准独立的石墨烯,但我们发现硼掺杂的石墨烯在 Ni(111)表面上的金插入行为更为复杂:对于石墨烯晶格中的低硼含量(2-5%),仅发生部分金插入,而对于更高的硼含量(高达 20%),则未观察到插入。为了理解这种不同的行为,我们进行了密度泛函理论研究,比较了 Ni(111)上未掺杂以及取代的氮和硼掺杂的石墨烯。我们确定硼原子与镍基底的更强结合是导致硼掺杂情况下不同插入行为的因素。然而,计算预测,这种能量效应仅在大的硼浓度下阻止插入过程,并且对于较小的硼覆盖度可以克服,与我们的 X 射线光电子能谱实验一致。