Chkhalo N I, Drozdov M N, Gusev S A, Lopatin A Ya, Luchin V I, Salashchenko N N, Tatarskiy D A, Tsybin N N, Zuev S Yu
Appl Opt. 2019 Jan 1;58(1):21-28. doi: 10.1364/AO.58.000021.
Aluminum thin-film spectral filters are widely used in telescopes for space observations of the Sun in the extreme ultraviolet range of wavelengths. The main purpose of film filters is to block radiation in the UV, visible, and near-IR spectral ranges. In connection with the development of new projects for the observation of the Sun from close distances, the thermal stability of the entrance film filter is an important characteristic. In this paper, the thermal stability of Al films with 2.5 nm thick MoSi protective cap layers has been studied. MoSi was chosen as a coating material because MoSi caps effectively protect the Al film from oxidation and simultaneously increase the mechanical strength of the Al film. Vacuum annealing of MoSi/Al/MoSi films was carried out at temperatures up to 300°C. It has been demonstrated that at an annealing temperature of more than 200°C for 24 h, a noticeable decrease in the blocking properties of the MoSi/Al/MoSi film is observed in the visible wavelength range, which is caused by the appearance of semi-transparent crystalline silicon dendritic structures that are tens of micrometers in size in the film. In the annealed area of the film specimen, the intermetallic AlMo phase was detected by electron diffraction structure analysis, indicating a possible reason for the appearance of silicon atoms needed for dendrite growth as a result of the chemical interaction of Al and MoSi. Due to the requirements for a high degree of visible radiation blocking (10 to 10 times), the appearance of even one dendritic structure significantly reduces the blocking properties of the film filter and is, therefore, not permissible. Based on the measurement of the transmission of MoSi-2.5 nm/Al-72 nm/MoSi-2.5 nm films at 633 nm for isothermal annealing at 200°C-250°C, the activation energy for the formation of dendritic structures (E=1.55±0.1 eV) was measured and the maximum permissible film temperature (130°C) at which dendritic structures did not appear during a 5-year mission was predicted.
铝薄膜光谱滤光片广泛应用于望远镜,用于在极紫外波长范围内对太阳进行空间观测。薄膜滤光片的主要目的是阻挡紫外、可见光和近红外光谱范围内的辐射。随着近距离观测太阳新项目的开展,入射薄膜滤光片的热稳定性成为一项重要特性。本文研究了具有2.5纳米厚MoSi保护帽层的铝膜的热稳定性。选择MoSi作为涂层材料是因为MoSi帽层能有效保护铝膜不被氧化,同时提高铝膜的机械强度。对MoSi/Al/MoSi薄膜在高达300°C的温度下进行真空退火。结果表明,在200°C以上退火24小时时,在可见光波长范围内观察到MoSi/Al/MoSi薄膜的阻挡性能明显下降,这是由于薄膜中出现了尺寸达几十微米的半透明晶体硅树枝状结构。通过电子衍射结构分析在薄膜试样的退火区域检测到金属间化合物AlMo相,这表明由于Al与MoSi的化学相互作用,可能是枝晶生长所需硅原子出现的原因。由于对可见光辐射的高阻挡度要求(10到10倍),即使出现一个树枝状结构也会显著降低薄膜滤光片的阻挡性能,因此是不允许的。基于对MoSi-2.5 nm/Al-72 nm/MoSi-2.5 nm薄膜在200°C - 250°C等温退火时633纳米处透过率的测量,测定了树枝状结构形成的活化能(E = 1.55±0.1 eV),并预测了在5年任务期间不出现树枝状结构的最大允许薄膜温度(130°C)。