皮肤晚期糖基化终产物作为精神分裂症光敏感性的生物标志物。
Skin advanced glycation end products as biomarkers of photosensitivity in schizophrenia.
机构信息
Juntendo University Schizophrenia Projects (JUSP), Department of Psychiatry, Faculty of Medicine, Juntendo University, Tokyo, Japan.
Department of Dermatology and Allergology, Juntendo University Graduate School of Medicine, Tokyo, Japan.
出版信息
Int J Methods Psychiatr Res. 2019 Mar;28(1):e1769. doi: 10.1002/mpr.1769. Epub 2019 Jan 31.
OBJECTIVES
Photosensitivity to ultraviolet A (UVA) radiation from sunlight is an important side effect of treatment with antipsychotic agents. However, the pathophysiology of drug-induced photosensitivity remains unclear. Recent studies demonstrated the accumulation of advanced glycation end products (AGEs), annotated as carbonyl stress, to be associated with the pathophysiology of schizophrenia. In this study, we investigated the relationship among skin AGE levels, minimal response dose (MRD) with UVA for photosensitivity, and the daily dose of antipsychotic agents in patients with schizophrenia and healthy controls.
METHODS
We enrolled 14 patients with schizophrenia and 14 healthy controls. Measurement of skin AGE levels was conducted with AGE scanner, a fluorometric method for assaying skin AGE levels. Measurement of MRD was conducted with UV irradiation device.
RESULTS
Skin AGE levels and MRD at 24, 48, and 72 hr in patients with schizophrenia showed a higher tendency for photosensitivity than in the controls, but the difference was statistically insignificant. Multiple linear regression analysis using skin AGE levels failed to show any influence of independent variables. MRD did not affect skin AGE levels.
CONCLUSIONS
Photosensitivity to UVA in patients with schizophrenia receiving treatment with antipsychotic agents might not be affected by skin AGE levels.
目的
阳光中紫外线 A（UVA）辐射的光敏感性是抗精神病药物治疗的一个重要副作用。然而，药物诱导的光敏感性的病理生理学仍然不清楚。最近的研究表明，晚期糖基化终产物（AGEs）的积累，被注释为羰基应激，与精神分裂症的病理生理学有关。在这项研究中，我们研究了精神分裂症患者的皮肤 AGE 水平、最小反应剂量（MRD）与 UVA 光敏感性以及抗精神病药物的日剂量之间的关系。
方法
我们招募了 14 名精神分裂症患者和 14 名健康对照者。皮肤 AGE 水平的测量采用 AGE 扫描仪进行，这是一种用于检测皮肤 AGE 水平的荧光法。MRD 的测量采用紫外线照射装置进行。
结果
精神分裂症患者的皮肤 AGE 水平和 24、48 和 72 小时的 MRD 表现出比对照组更高的光敏感性趋势，但差异无统计学意义。使用皮肤 AGE 水平的多元线性回归分析未能显示出任何自变量的影响。MRD 不会影响皮肤 AGE 水平。
结论
接受抗精神病药物治疗的精神分裂症患者对 UVA 的光敏感性可能不受皮肤 AGE 水平的影响。
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