Steep-slope field-effect transistors with AlGaN/GaN HEMT and oxide-based threshold switching device.

We report the demonstration of a steep-slope field-effect transistor with AlGaN/GaN MIS-HEMTs employing SiO-based threshold switching devices in series with the source. The SiO-based threshold switching devices exhibited steep slope when changing resistance states. The integrated steep-slope transistor showed a low subthreshold swing of sub-5 mV/dec with a transition range of over 10 in the transfer characteristics in both sweep directions at room temperature, as well as the low leakage current (10 μA μm) and a high I /I ratio (>10). Moreover, with the SiO-based threshold switching devices we also observed a positive shift of threshold voltages of the integrated device. Results from more than 50 transfer characteristics measurements also indicate the good repeatability and practicability of such a steep-switching device, where the average steep slopes are below 10 mV/decade. This steep-slope transistor with oxide-based threshold switching devices can be further extended to various transistor platforms like Si and III-V and are of potential interest for the development of power switching and high frequency devices.