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基于GeSeTe的双向阈值开关器件的场效应晶体管电学特性改善

Improved Electrical Characteristics of Field Effect Transistors with GeSeTe-Based Ovonic Threshold Switching Devices.

作者信息

Lee Su Yeon, Seo Hyun Kyu, Jeong Se Yeon, Yang Min Kyu

机构信息

Artificial Intelligence Convergence Research Laboratory, Sahmyook University, Seoul 01795, Republic of Korea.

出版信息

Materials (Basel). 2023 Jun 11;16(12):4315. doi: 10.3390/ma16124315.

DOI:10.3390/ma16124315
PMID:37374499
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10305494/
Abstract

Hyper-field effect transistors (hyper-FETs) are crucial in the development of low-power logic devices. With the increasing significance of power consumption and energy efficiency, conventional logic devices can no longer achieve the required performance and low-power operation. Next-generation logic devices are designed based on complementary metal-oxide-semiconductor circuits, and the subthreshold swing of existing metal-oxide semiconductor field effect transistors (MOSFETs) cannot be reduced below 60 mV/dec at room temperature owing to the thermionic carrier injection mechanism in the source region. Therefore, new devices must be developed to overcome these limitations. In this study, we present a novel threshold switch (TS) material, which can be applied to logic devices by employing ovonic threshold switch (OTS) materials, failure control of insulator-metal transition materials, and structural optimization. The proposed TS material is connected to a FET device to evaluate its performance. The results demonstrate that commercial transistors connected in series with GeSeTe-based OTS devices exhibit significantly lower subthreshold swing values, high on/off current ratios, and high durability of up to 10.

摘要

超场效应晶体管(hyper-FET)在低功耗逻辑器件的发展中至关重要。随着功耗和能源效率的重要性日益增加,传统逻辑器件已无法实现所需的性能和低功耗运行。下一代逻辑器件基于互补金属氧化物半导体电路设计,由于源区的热电子载流子注入机制,现有金属氧化物半导体场效应晶体管(MOSFET)在室温下的亚阈值摆幅无法降低到60 mV/dec以下。因此,必须开发新器件来克服这些限制。在本研究中,我们提出了一种新型阈值开关(TS)材料,通过采用硫族化物阈值开关(OTS)材料、绝缘体-金属转变材料的失效控制和结构优化,可将其应用于逻辑器件。将所提出的TS材料连接到FET器件上以评估其性能。结果表明,与基于GeSeTe的OTS器件串联连接的商用晶体管表现出显著更低的亚阈值摆幅值、高的开/关电流比以及高达10的高耐久性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/063dc8d0622a/materials-16-04315-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/15490633f5a7/materials-16-04315-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/a4e3b0af3564/materials-16-04315-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/fadfb3ae5bd1/materials-16-04315-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/d07bc8e2b23c/materials-16-04315-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/0fce6b498096/materials-16-04315-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/063dc8d0622a/materials-16-04315-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/15490633f5a7/materials-16-04315-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/a4e3b0af3564/materials-16-04315-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/fadfb3ae5bd1/materials-16-04315-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/d07bc8e2b23c/materials-16-04315-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/0fce6b498096/materials-16-04315-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b092/10305494/063dc8d0622a/materials-16-04315-g006.jpg

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