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Ti-Ni-Si 薄膜系统的结构和功能特性。

Structural and Functional Properties of the Thin Film System Ti-Ni-Si.

机构信息

Chair for MEMS Materials, Institute for Materials, Faculty of Mechanical Engineering , Ruhr University Bochum , Universitaetsstrasse 150 , D-44801 Bochum , Germany.

Institute of Materials Research , German Aerospace Center (DLR) , Linder Hoehe , D-51147 Cologne , Germany.

出版信息

ACS Comb Sci. 2019 May 13;21(5):362-369. doi: 10.1021/acscombsci.8b00181. Epub 2019 Mar 14.

DOI:10.1021/acscombsci.8b00181
PMID:30822380
Abstract

The thin film system Ti-Ni-Si was investigated using methods of combinatorial materials science. A thin film composition spread library of the system was fabricated using combinatorial magnetron sputtering. The functional properties Seebeck coefficient, electrical resistivity, and luminance were determined using high-throughput characterization techniques. A thin-film phase diagram was established by the assessment of high-throughput X-ray diffraction results. Correlations between composition, phase constitution, and functional properties with focus on the binary composition space are discussed.

摘要

采用组合材料科学的方法研究了 Ti-Ni-Si 薄膜系统。使用组合磁控溅射制备了薄膜组成扩展库。使用高通量特性测试技术确定了 Seebeck 系数、电阻率和亮度等功能特性。通过评估高通量 X 射线衍射结果建立了薄膜相图。讨论了组成、相结构和功能特性之间的相关性,重点是二元组成空间。

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