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石墨烯/砷化镓异质结构中可调谐的二维砷化镓和石墨烯带隙:一项从头算研究。

Tunable 2D-gallium arsenide and graphene bandgaps in a graphene/GaAs heterostructure: an ab initio study.

作者信息

González-García A, López-Pérez W, González-Hernández R, Rodríguez J A, Milośević M V, Peeters F M

机构信息

Grupo de Investigación en Física Aplicada, Departamento de Física, Universidad del Norte, Barranquilla, Colombia. Departement Fysica, Universiteit Antwerpen, Groenenborgerlaan 171, B-2020 Antwerpen, Belgium.

出版信息

J Phys Condens Matter. 2019 Jul 3;31(26):265502. doi: 10.1088/1361-648X/ab0d70. Epub 2019 Mar 6.

Abstract

The bandgap behavior of 2D-GaAs and graphene have been investigated with van der Waals heterostructured into a yet unexplored graphene/GaAs bilayer, under both uniaxial stress along c axis and different planar strain distributions. The 2D-GaAs bandgap nature changes from [Formula: see text]-K indirect in isolated monolayer to [Formula: see text]-[Formula: see text] direct in graphene/GaAs bilayer. In the latter, graphene exhibits a bandgap of 5 meV. The uniaxial stress strongly affects the graphene electronic bandgap, while symmetric in-plane strain does not open the bandgap in graphene. Nevertheless, it induces remarkable changes on the GaAs bandgap-width around the Fermi level. However, when applying asymmetric in-plane strain to graphene/GaAs, the graphene sublattice symmetry is broken, and the graphene bandgap is open at the Fermi level to a maximum width of 814 meV. This value is much higher than that reported for just graphene under asymmetric strain. The [Formula: see text]-[Formula: see text] direct bandgap of GaAs remains unchanged in graphene/GaAs under different types of applied strain. The analyses of phonon dispersion and the elastic constants yield the dynamical and mechanical stability of the graphene/GaAs system, respectively. The calculated mechanical properties for bilayer heterostructure are better than those of their constituent monolayers. This finding, together with the tunable graphene bandgap not only by the strength but also by the direction of the strain, enhance the potential for strain engineering of ultrathin group-III-V electronic devices hybridized by graphene.

摘要

通过将范德华异质结构制成尚未探索的石墨烯/砷化镓双层,研究了二维砷化镓和石墨烯在沿c轴的单轴应力和不同平面应变分布下的带隙行为。二维砷化镓的带隙性质从孤立单层中的[公式:见原文]-K间接带隙变为石墨烯/砷化镓双层中的[公式:见原文]-[公式:见原文]直接带隙。在后者中,石墨烯表现出5毫电子伏特的带隙。单轴应力强烈影响石墨烯的电子带隙,而对称的面内应变不会在石墨烯中打开带隙。然而,它会在费米能级附近引起砷化镓带隙宽度的显著变化。然而,当对石墨烯/砷化镓施加不对称面内应变时,石墨烯子晶格对称性被打破,石墨烯带隙在费米能级处打开,最大宽度为814毫电子伏特。该值远高于在不对称应变下仅针对石墨烯报道的值。在不同类型的外加应变下,石墨烯/砷化镓中砷化镓的[公式:见原文]-[公式:见原文]直接带隙保持不变。声子色散和弹性常数的分析分别得出了石墨烯/砷化镓系统的动力学和力学稳定性。双层异质结构的计算力学性能优于其组成单层。这一发现,连同不仅可以通过应变强度而且可以通过应变方向来调节的石墨烯带隙,增强了通过石墨烯杂交的超薄III-V族电子器件进行应变工程的潜力。

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