Seo Okkyun, Tayal Akhil, Kim Jaemyung, Song Chulho, Chen Yanna, Hiroi Satoshi, Katsuya Yoshio, Ina Toshiaki, Sakata Osami, Ikeya Yuki, Takano Shiori, Matsuda Akifumi, Yoshimoto Mamoru
Synchrotron X-ray Group, Research Center for Advanced Measurement and Characterization, National Institute for Materials Science (NIMS), Kouto, Sayo, Hyogo, 679-5148, Japan.
Synchrotron X-ray Station at SPring-8, Research Network and Facility Services Division, NIMS, Kouto, Sayo, Hyogo, 679-5148, Japan.
Sci Rep. 2019 Mar 13;9(1):4304. doi: 10.1038/s41598-019-41049-9.
We have investigated the structural, optical band gap, and electrical properties of (FeO):(NiO) (x = 0.3, 0.4, 0.5, 0.6 and 0.7) epitaxial thin films grown on an atomically smooth substrate at room temperature. With increasing FeO content, the rock-salt structure of the thin films transformed to a spinel structure above x = 0.6. In terms of the local structure, the increased ratio of Fe ions to Fe ions indicates that the octahedral sites of FeO were continuously transformed into distorted octahedral and tetrahedral sites. On the other hand, the NiO matrix was not affected by the local structure change. Chemical composition of FeO:NiO affected the crystal structure, the electrical conductivity and the optical band gap of direct transition (3.35 to 2.99 eV).
我们研究了在室温下生长于原子级光滑衬底上的(FeO):(NiO)(x = 0.3、0.4、0.5、0.6和0.7)外延薄膜的结构、光学带隙和电学性质。随着FeO含量的增加,薄膜的岩盐结构在x > 0.6时转变为尖晶石结构。就局部结构而言,Fe离子与Fe离子的比例增加表明FeO的八面体位点不断转变为扭曲的八面体和四面体位点。另一方面,NiO基体不受局部结构变化的影响。FeO:NiO的化学成分影响晶体结构、电导率和直接跃迁的光学带隙(从3.35到2.99 eV)。