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使用蒙特卡罗 X 射线深度分布对体材料和多层材料的特征和韧致辐射 X 射线进行二次荧光校正。

Secondary Fluorescence Correction for Characteristic and Bremsstrahlung X-Rays Using Monte Carlo X-ray Depth Distributions Applied to Bulk and Multilayer Materials.

机构信息

Department of Mining and Materials Engineering,McGill University,3610 Rue University,Montreal, Quebec, H3A 0C5,Canada.

Centre d'excellence en électrification des transports et stockage d'énergie,IREQ, 1806 Boulevard Lionel-Boulet,Varennes, Québec, J3X 1S1,Canada.

出版信息

Microsc Microanal. 2019 Feb;25(1):92-104. doi: 10.1017/S1431927618016215.

Abstract

Secondary fluorescence effects are important sources of characteristic X-ray emissions, especially for materials with complicated geometries. Currently, three approaches are used to calculate fluorescence X-ray intensities. One is using Monte Carlo simulations, which are accurate but have drawbacks such as long computation times. The second one is to use analytical models, which are computationally efficient, but limited to specific geometries. The last approach is a hybrid model, which combines Monte Carlo simulations and analytical calculations. In this article, a program is developed by combining Monte Carlo simulations for X-ray depth distributions and an analytical model to calculate the secondary fluorescence. The X-ray depth distribution curves of both the characteristic and bremsstrahlung X-rays obtained from Monte Carlo program MC X-ray allow us to quickly calculate the total fluorescence X-ray intensities. The fluorescence correction program can be applied to both bulk and multilayer materials. Examples for both cases are shown. Simulated results of our program are compared with both experimental data from the literature and simulation data from PENEPMA and DTSA-II. The practical application of the hybrid model is presented by comparing with the complete Monte Carlo program.

摘要

次生荧光效应是特征 X 射线发射的重要来源,特别是对于具有复杂几何形状的材料。目前,有三种方法可用于计算荧光 X 射线强度。一种是使用蒙特卡罗模拟,虽然准确但计算时间长。第二种是使用解析模型,计算效率高,但限于特定的几何形状。最后一种是混合模型,它结合了蒙特卡罗模拟和解析计算。在本文中,通过将蒙特卡罗模拟的 X 射线深度分布和用于计算次生荧光的解析模型相结合,开发了一个程序。从蒙特卡罗程序 MC X-ray 获得的特征和韧致辐射 X 射线的 X 射线深度分布曲线使我们能够快速计算总荧光 X 射线强度。荧光修正程序可应用于块状和多层材料。两种情况都给出了示例。我们程序的模拟结果与文献中的实验数据以及 PENEPMA 和 DTSA-II 的模拟数据进行了比较。通过与完整的蒙特卡罗程序进行比较,展示了混合模型的实际应用。

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