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通过光热显微镜研究薄膜涂层中的激光退火机制。

Investigation of laser annealing mechanisms in thin film coatings by photothermal microscopy.

作者信息

Escola Facundo Zaldivar, Mingolo Nélida, Martínez Oscar E, Rocca Jorge J, Menoni Carmen S

出版信息

Opt Express. 2019 Feb 18;27(4):5729-5744. doi: 10.1364/OE.27.005729.

DOI:10.1364/OE.27.005729
PMID:30876169
Abstract

We study the evolution of the absorptance of amorphous metal oxide thin films when exposed to intense CW laser radiation measured using a photothermal microscope. The evolution of the absorptance is characterized by a nonexponential decay. Different models that incorporate linear and nonlinear absorption, free carrier absorption, and defect diffusion are used to fit the results, with constraints imposed on the fit parameters to scale with power and intensity. The model that best fits is that two types of interband defects are passivated independently, one by a one-photon process and the other one by a two-photon process.

摘要

我们研究了非晶态金属氧化物薄膜在受到连续波强激光辐射时吸收率的变化,该变化是用光热显微镜测量的。吸收率的变化表现为非指数衰减。采用了包含线性和非线性吸收、自由载流子吸收以及缺陷扩散的不同模型来拟合结果,并对拟合参数施加约束,使其与功率和强度成比例。最符合的模型是两种带间缺陷分别被钝化,一种通过单光子过程,另一种通过双光子过程。

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