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精神分裂症患者的灰质微结构异常与工作记忆缺陷

Gray Matter Microstructural Abnormalities and Working Memory Deficits in Individuals with Schizophrenia.

作者信息

Kim HyunJung, Shon Seung-Hyun, Joo Sung Woo, Yoon Woon, Lee Jang-Han, Hur Ji-Won, Lee JungSun

机构信息

Department of Clinical & Counseling Psychology, Graduate School of Psychological Service, Chung-Ang University, Seoul, Republic of Korea.

Department of Psychiatry, University of Ulsan College of Medicine, Asan Medical Center, Seoul, Republic of Korea.

出版信息

Psychiatry Investig. 2019 Mar;16(3):234-243. doi: 10.30773/pi.2018.10.14.1. Epub 2019 Mar 21.

Abstract

OBJECTIVE

Working memory impairments serve as prognostic factors for patients with schizophrenia. Working memory deficits are mainly associated with gray matter (GM) thickness and volume. We investigated the association between GM diffusivity and working memory in controls and individuals with schizophrenia.

METHODS

T1 and diffusion tensor images of the brain, working memory task (letter number sequencing) scores, and the demographic data of 90 individuals with schizophrenia and 97 controls were collected from the SchizConnect database. T1 images were parcellated into the 68 GM Regions of Interest (ROI). Axial Diffusivity (AD), Fractional Anisotropy (FA), Radial Diffusivity (RD), and Trace (TR) were calculated for each of the ROIs.

RESULTS

Compared to the controls, schizophrenia group showed significantly increased AD, RD, and TR in specific regions on the frontal, temporal, and anterior cingulate area. Moreover, working memory was negatively correlated with AD, RD, and TR in the lateral orbitofrontal, superior temporal, inferior temporal, and rostral anterior cingulate area on left hemisphere in the individuals with schizophrenia.

CONCLUSION

These results demonstrated GM microstructural abnormalities in the frontal, temporal, and anterior cingulate regions of individuals with schizophrenia. Furthermore, these regional GM microstructural abnormalities suggest a neuropathological basis for the working memory deficits observed clinically in individuals with schizophrenia.

摘要

目的

工作记忆损害是精神分裂症患者的预后因素。工作记忆缺陷主要与灰质(GM)厚度和体积有关。我们研究了对照组和精神分裂症患者中GM扩散率与工作记忆之间的关联。

方法

从SchizConnect数据库收集了90名精神分裂症患者和97名对照者的脑部T1和扩散张量图像、工作记忆任务(字母数字序列)得分以及人口统计学数据。T1图像被分割为68个灰质感兴趣区域(ROI)。计算每个ROI的轴向扩散率(AD)、分数各向异性(FA)、径向扩散率(RD)和迹线(TR)。

结果

与对照组相比,精神分裂症组在额叶、颞叶和前扣带区域的特定区域显示AD、RD和TR显著增加。此外,在精神分裂症患者中,工作记忆与左半球外侧眶额、颞上、颞下和喙前扣带区域的AD、RD和TR呈负相关。

结论

这些结果表明精神分裂症患者额叶、颞叶和前扣带区域存在GM微观结构异常。此外,这些区域GM微观结构异常为精神分裂症患者临床上观察到的工作记忆缺陷提供了神经病理学基础。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3823/6444097/4a46619766f1/pi-2018-10-14-1f1.jpg

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