席夫碱金属配合物存在下PVC薄膜光化学过程的光谱、物理及形貌研究

Yousif Emad, Hasan Ali, El-Hiti Gamal A

Department of Chemistry, College of Science, Al-Nahrain University, Baghdad 64021, Iraq.

Cornea Research Chair, Department of Optometry, College of Applied Medical Sciences, King Saud University, P.O. Box 10219, Riyadh 11433, Saudi Arabia.

Polymers (Basel). 2016 May 25;8(6):204. doi: 10.3390/polym8060204.

The photostability of poly(vinyl chloride), PVC, containing various Schiff base metal complexes (0.5% by weight) was investigated. Various indices corresponding to a number of functional groups were monitored with irradiation of polymeric films to determine their photostabilization activities. The quantum yield of the chain scission (Φcs) of modified polymeric films was found to be (1.15⁻4.65) × 10⁶. The surface morphology of a PVC sample was investigated by the use of atomic force microscope (AFM). The photostability of PVC films in the presence of Schiff base additives was found to follow the following order: PVC < PVC + CuL₂ < PVC + CdL₂ < PVC + ZnL₂ < PVC + SnL₂ < PVC + NiL₂. Various mechanisms for PVC films photostability containing the Schiff base additives have been suggested.

研究了含有各种席夫碱金属配合物（重量百分比为0.5%）的聚氯乙烯（PVC）的光稳定性。在用聚合物薄膜辐照时监测了与多个官能团相对应的各种指标，以确定它们的光稳定活性。发现改性聚合物薄膜的链断裂量子产率（Φcs）为(1.15⁻4.65) × 10⁶。使用原子力显微镜（AFM）研究了PVC样品的表面形态。发现席夫碱添加剂存在下PVC薄膜的光稳定性遵循以下顺序：PVC < PVC + CuL₂ < PVC + CdL₂ < PVC + ZnL₂ < PVC + SnL₂ < PVC + NiL₂。已经提出了含有席夫碱添加剂的PVC薄膜光稳定性的各种机制。