新型四席夫碱作为聚氯乙烯的高效光稳定剂。
New Tetra-Schiff Bases as Efficient Photostabilizers for Poly(vinyl chloride).
机构信息
Department of Chemistry, College of Science, Tikrit University, Tikrit 34001, Iraq.
Department of Optometry, College of Applied Medical Sciences, King Saud University, P.O. Box 10219, Riyadh 11433, Saudi Arabia.
出版信息
Molecules. 2017 Sep 9;22(9):1506. doi: 10.3390/molecules22091506.
Three new tetra-Schiff bases were synthesized and characterized to be used as photostabilizers for poly(vinyl chloride) (PVC) films. The photostability of PVC films (40 μm thickness) in the presence of Schiff bases (0.5 wt %) upon irradiation (300 h) with a UV light (λ = 365 nm and light intensity = 6.43 × 10 ein∙dm∙s) was examined using various spectroscopic measurements and surface morphology analysis. The changes in various functional groups' indices, weight and viscosity average molecular weight of PVC films were monitored against irradiation time. The additives used showed photostability for PVC films, with Schiff base being the most effective additive upon irradiation, followed by and . The atomic force microscopy (AFM) images for the PVC surface containing Schiff base after irradiation were found to be smooth, with a roughness factor (q) of 36.8, compared to 132.2 for the PVC (blank). Several possible mechanisms that explain PVC photostabilization upon irradiation in the presence of tetra-Schiff bases were proposed.
合成了三个新的四席夫碱，并将其表征为聚氯乙烯（PVC）薄膜的光稳定剂。通过各种光谱测量和表面形貌分析，研究了在 365nm 紫外光（光强度=6.43×10 ein∙dm∙s）照射下，含有席夫碱（0.5wt%）的 PVC 薄膜（40μm 厚）的光稳定性。监测了 PVC 薄膜在辐照时间内各种官能团指数、重量和重均分子量的变化。所用添加剂对 PVC 薄膜表现出光稳定性，其中席夫碱 在辐照时最有效，其次是 和 。发现辐照后含有席夫碱 的 PVC 表面的原子力显微镜（AFM）图像是光滑的，粗糙度因子（q）为 36.8，而空白 PVC（空白）的 q 值为 132.2。提出了几种可能的机制来解释在四席夫碱存在下辐照时 PVC 的光稳定化。
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