Tigan Dogancan, Genlik Sevim Polat, Imer Bilge, Unalan Husnu Emrah
Department of Metallurgical and Materials Engineering, Middle East Technical University (METU), Ankara 06800, Turkey.
Nanotechnology. 2019 Aug 9;30(32):325202. doi: 10.1088/1361-6528/ab19c6. Epub 2019 Apr 16.
Copper nanowires (Cu NWs) appear as the strongest alternative to silver nanowires (Ag NWs) in transparent conductors. Cu NWs; however, are more prone to oxidation compared to Ag NWs even at room temperature. This problem becomes more severe when Cu NWs are used as transparent thin film heaters (TTFHs). In this work, we have utilized ALD deposited zinc oxide (ZnO) shell layers, and provide a comparison with typically used aluminum oxide (AlO) shell layers to improve the TTFH performance. While Cu NW network TTFHs barely withstood temperatures around 100 °C, critical thickness of ALD deposited AlO and ZnO layers were determined to find out TTFH limits. Maximum stable and reproducible temperatures of 273 °C and 204 °C were obtained for AlO and ZnO deposited Cu NW network TTFHs, respectively. An extensive parametric study on the NW density and oxide type in conjunction with the electrical conductivity and optical transmittance was conducted. A remarkably high heating rate of 14 °C s was obtained from the fabricated core/shell networks with improved oxidation stability under ambient and high humidity conditions. Finally, these high performance core/shell Cu NW network TTFHs were utilized as efficient defrosters.
在透明导体中，铜纳米线（Cu NWs）似乎是银纳米线（Ag NWs）最有力的替代品。然而，即使在室温下，与Ag NWs相比，Cu NWs更容易氧化。当Cu NWs用作透明薄膜加热器（TTFHs）时，这个问题变得更加严重。在这项工作中，我们利用原子层沉积（ALD）的氧化锌（ZnO）壳层，并与通常使用的氧化铝（AlO）壳层进行比较，以提高TTFH的性能。虽然Cu NW网络TTFHs在100°C左右几乎无法承受温度，但通过确定ALD沉积的AlO和ZnO层的临界厚度来找出TTFH的极限。对于沉积了AlO和ZnO的Cu NW网络TTFHs，分别获得了273°C和204°C的最大稳定且可重复的温度。结合电导率和光学透射率，对NW密度和氧化物类型进行了广泛的参数研究。在环境和高湿度条件下，从具有改进的氧化稳定性的制造的核壳网络中获得了高达14°C/s的显著加热速率。最后，这些高性能的核壳Cu NW网络TTFHs被用作高效除霜器。
